Wafer cleaning liquid recovery equipment

Abstract

The invention discloses wafer cleaning fluid recovery equipment. The wafer cleaning fluid recovery equipment structurally comprises a movable recovery device, a shielding device, a fluid director, a turntable, a rotating shaft, a motor and a pushing device, wherein the bottom of the turntable is connected with the rotating shaft; the bottom of the rotating shaft is connected with the motor arranged in the fluid director; the shielding device is arranged on the left side of the fluid director; the movable recovery device is mounted below the fluid director; a movable recovery tank is movably connected with the pushing device; the fluid director comprises side plates, an inclined plate, a coaming and a bottom plate; the bottom of the coaming is connected with the bottom plate; two ends of the coaming are respectively connected with the side plates; the inclined plate is connected with the bottom plate and the coaming; and the movable recovery device includes a sliding rail, a recycling groove, an output pipe, a partition plate and a support plate. The wafer cleaning fluid recovery equipment has the beneficial effects that through the design, cleaning liquid can directly flow into thecorresponding recovery tank, and the phenomenon of splashing or water leakage cannot occur, and the type of the cleaning liquid can be judged through the PH value, and the position of the recovery tank is automatically adjusted, and the wafer cleaning fluid recovery equipment is more intelligent.

Description

technical field [0001] The invention relates to the field of wafer processing, in particular to a wafer cleaning liquid recycling device. Background technique [0002] Wafer refers to the silicon wafer used in the production of silicon semiconductor integrated circuits. Because of its circular shape, it is called a wafer; it can be processed into various circuit element structures on the silicon wafer, and becomes an integrated circuit with specific electrical functions. circuit products. [0003] The existing patent No. 201711167935.9 wafer cleaning liquid recovery device includes a recovery unit, a lifting unit and a discharge unit, and the recovery unit includes a plurality of annular recovery tanks arranged continuously in the vertical direction; The unit is used to control the recovery unit to move in the vertical direction, so that the plurality of recovery tanks on the recovery unit are used to recover different wafer cleaning liquids respectively; the discharge unit...

AI Technical Summary

Problems solved by technology

By using the wafer cleaning liquid recovery device described in the present invention, various wafer cleaning liquids can be effectively collected and discharged separately, reducing the possibility of chemical reactions between various cleaning liquids and reducing the need for discharge pipes. The damage caused effectively improves the service life and safety of the discharge pipe, but the invention still causes water leakage during sorting and recycling, the sorting and recycling are not complete, and the type of cleaning fluid needs to be determined manually, which is troublesome

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