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Exposure machine

An exposure machine and light reflectivity technology, applied in the field of exposure machines, can solve problems such as uneven exposure of substrates, and achieve the effect of improving exposure uniformity

Active Publication Date: 2022-04-05
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This will result in uneven exposure to the substrate

Method used

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Embodiment Construction

[0025] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0026] In the description of the present application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation indicated by rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc. The positional relationship is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the a...

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Abstract

The application discloses an exposure machine. The exposure machine includes: a carrying platform, the carrying platform is used to carry the substrate; a lifting rod, the lifting rod and the carrying platform are arranged at intervals; a reflective layer, the reflecting layer is arranged on the first side of the carrying platform, and the reflecting layer is arranged on the second side of the lifting rod side, wherein, the reflectivity of the reflective layer to light is smaller than the reflectivity of the first side to light, and the reflectivity of the reflective layer to light is smaller than the reflectivity of the second side to light, and the first side is that the carrying platform is opposite to the mask One side is set, and the second side is the side where the lifting rod is set opposite to the mask plate. In the present application, by setting a reflective layer with a small reflectivity on the first side opposite to the mask plate of the carrier table and the second side of the lift rod opposite to the mask plate, it is possible to reduce the The difference in light reflection in the gap improves the exposure uniformity of the substrate.

Description

technical field [0001] The present application relates to the field of display technology, in particular to an exposure machine. Background technique [0002] During the manufacturing process of the display panel, it is necessary to use an exposure machine to expose the substrate multiple times. The exposure machine includes two carrying tables, and a lifting rod arranged between the two carrying tables. There is a gap area between the lifting rod and the adjacent bearing platform. [0003] When the exposure machine is used to expose the substrate panel through the mask plate, the light reflectance of the gap area is not only lower than that of the carrier table, but also lower than that of the lifting rod. This will result in uneven exposure to the substrate. [0004] Therefore, it is necessary to provide an exposure machine capable of uniformly exposing the substrate. Contents of the invention [0005] The embodiment of the present application provides an exposure ma...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70716G03F7/70425
Inventor 袁继旺
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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