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A kind of preparation method of rotating structure and rotating structure

A technology of rotating structure and rotating unit, applied in the field of micro-electromechanical systems, can solve the problems of complex process, low driving voltage and high driving voltage

Active Publication Date: 2021-02-09
SIWAVE INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to improve the disadvantages of high driving voltage of the traditional structure, it is a better method to adopt a step plate structure. The more steps the structure is, the closer the structure is to the slope structure, and the corresponding driving voltage will be lower, but at the same time the process becomes more advanced. complex
[0006] Based on this, in the prior art, the preparation process is simple, the performance is stable, and it is difficult to obtain an electrostatically driven rotating structure that does not require a higher voltage driving voltage.

Method used

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  • A kind of preparation method of rotating structure and rotating structure
  • A kind of preparation method of rotating structure and rotating structure
  • A kind of preparation method of rotating structure and rotating structure

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Embodiment Construction

[0028] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0029] The embodiment of the present invention provides a method for preparing a rotating structure, figure 1 It shows a schematic flow chart of a method for preparing a rotating structure provided by an embodiment of the present invention. The method for preparing a rotating structure provided by an embodiment of the present invention is used to prepare an electrostatically driven rotating structure. See figure 1 , the method includes the following steps:

[0030] Step 110, using a wet etching process to prepare...

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Abstract

An embodiment of the present invention provides a method for fabricating a rotating structure and the rotating structure, the method comprising: fabricating a first semiconductor structure using a wet etching process, wherein the first semiconductor structure includes a first slope groove on the first surface and The second slope groove located on the second surface; the slope surface of the first slope groove and the slope surface of the second slope groove are both (111) crystal planes; the preparation includes independently arranged first lower electrode connection units and second The lower electrode is connected to the second semiconductor structure of the unit; using a bonding process, the first semiconductor structure is arranged on the second semiconductor structure; a rotatable unit is prepared in a predetermined area of ​​the first semiconductor structure; An upper electrode, a first lower electrode, and a second lower electrode are prepared on one surface side. According to the technical solution provided by the embodiments of the present invention, the inclination angle of the prepared slope surface can be made very small, and the preparation process is simple, which improves the preparation flexibility of the slope surface.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of micro-electro-mechanical systems, and in particular, to a method for manufacturing a rotating structure and the rotating structure. Background technique [0002] In the field of microelectromechanical systems, rotating structures can be applied to wavefront correction of adaptive optics, spatial light modulation, alignment of optical elements, micromanipulators, optical switches, optical attenuators, and optical multiplexers. [0003] According to the different driving methods of the rotating structure, it is mainly divided into: electromagnetic drive, electrothermal drive, piezoelectric drive and electrostatic drive. Electromagnetic driving uses the magnetic force generated by electromagnets or permanent magnets as the driving force. The driving current of this driving method is large, the energy consumption is large, and the manufacture of magnetic films and the application of exte...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00B81C3/00B81B5/00
CPCB81B5/00B81B2201/04B81B2203/0323B81C1/00198B81C1/00539B81C3/001
Inventor 焦继伟刘京费跃陈思奇
Owner SIWAVE INC
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