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A kind of preparation method of rotating structure and rotating structure

A technology of rotating structure and rotating unit, which is applied in the field of micro-electromechanical systems, and can solve problems such as complex process, difficulty in electrostatically driven rotating structure, and high driving voltage

Active Publication Date: 2020-12-18
SIWAVE INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to improve the disadvantages of high driving voltage of the traditional structure, it is a better method to adopt a step plate structure. The more steps the structure is, the closer the structure is to the slope structure, and the corresponding driving voltage will be lower, but at the same time the process becomes more advanced. complex
[0006] Based on this, in the prior art, the preparation process is simple, the performance is stable, and it is difficult to obtain an electrostatically driven rotating structure that does not require a higher voltage driving voltage.

Method used

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  • A kind of preparation method of rotating structure and rotating structure
  • A kind of preparation method of rotating structure and rotating structure
  • A kind of preparation method of rotating structure and rotating structure

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Embodiment Construction

[0030] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0031] The embodiment of the present invention provides a method for preparing a rotating structure, figure 1 It shows a schematic flow chart of a method for preparing a rotating structure provided by an embodiment of the present invention. The method for preparing a rotating structure provided by an embodiment of the present invention is used to prepare an electrostatically driven rotating structure. See figure 1 , the method includes the following steps:

[0032] Step 110, using a wet etching process to prepare...

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Abstract

The embodiment of the invention provides a preparation method of a rotating structure, and the rotating structure. The method comprises the following steps: preparing a first semiconductor structure through employing a wet etching technology, wherein the first semiconductor structure comprises a first slope groove located on a first surface, and the slope surface of the first slope groove is a (111) crystal surface; preparing a second semiconductor structure comprising a first semiconductor unit and a second semiconductor unit which are independently arranged; arranging the first surface of the first semiconductor structure on the first semiconductor unit and the second semiconductor unit by adopting a bonding process; preparing a rotatable unit in a preset area of the first semiconductorstructure; and preparing an upper electrode, a first lower electrode and a second lower electrode on the surface, deviating from the first surface side, of the first semiconductor structure. Accordingto the technical scheme provided by the embodiment of the invention, the inclination angle of the prepared slope surface can be very small, the preparation process is simple, and the preparation flexibility of the slope surface is improved.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of micro-electro-mechanical systems, and in particular, to a method for manufacturing a rotating structure and the rotating structure. Background technique [0002] In the field of microelectromechanical systems, rotating structures can be applied to wavefront correction of adaptive optics, spatial light modulation, alignment of optical elements, micromanipulators, optical switches, optical attenuators, and optical multiplexers. [0003] According to the different driving methods of the rotating structure, it is mainly divided into: electromagnetic drive, electrothermal drive, piezoelectric drive and electrostatic drive. Electromagnetic driving uses the magnetic force generated by electromagnets or permanent magnets as the driving force. The driving current of this driving method is large, the energy consumption is large, and the manufacture of magnetic films and the application of exte...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81B3/00H01B7/02
CPCB81B3/0021B81B2201/034H01B7/02
Inventor 焦继伟刘京费跃陈思奇
Owner SIWAVE INC
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