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A kind of preparation method of rotating structure and rotating structure

A technology of rotating structure and rotating unit, applied in the field of micro-electromechanical systems, can solve the problems of low driving voltage, difficult electrostatic driving of rotating structure, complicated process, etc.

Active Publication Date: 2021-01-12
SIWAVE INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to improve the disadvantages of high driving voltage of the traditional structure, it is a better method to adopt a step plate structure. The more steps the structure is, the closer the structure is to the slope structure, and the corresponding driving voltage will be lower, but at the same time the process becomes more advanced. complex
[0006] Based on this, in the prior art, the preparation process is simple, the performance is stable, and it is difficult to obtain an electrostatically driven rotating structure that does not require a higher voltage driving voltage.

Method used

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  • A kind of preparation method of rotating structure and rotating structure
  • A kind of preparation method of rotating structure and rotating structure
  • A kind of preparation method of rotating structure and rotating structure

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Embodiment Construction

[0028] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0029] The embodiment of the present invention provides a method for preparing a rotating structure, figure 1 It shows a schematic flow chart of a method for preparing a rotating structure provided by an embodiment of the present invention. The method for preparing a rotating structure provided by an embodiment of the present invention is used to prepare an electrostatically driven rotating structure. See figure 1 , the method includes the following steps:

[0030] Step 110, using a wet etching process to prepare...

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Abstract

The embodiment of the invention provides a preparation method of a rotating structure and the rotating structure, and the method comprises the steps: employing a wet etching technology to prepare a first semiconductor structure, wherein the first semiconductor structure comprises a first slope groove located on a first surface and a second slope groove located on a second surface and the slope surface of the first slope groove and the slope surface of the second slope groove are crystal surfaces (111); preparing a second semiconductor structure by adopting a wet etching process, the second semiconductor structure comprising a first semiconductor unit and a second semiconductor unit which are independently arranged; preparing a rotatable unit in a preset area of the first semiconductor structure, wherein an upper electrode is electrically connected with the rotatable unit, a first lower electrode is electrically connected with the first semiconductor unit, and a second lower electrode is electrically connected with the second semiconductor unit. According to the technical scheme provided by the embodiment of the invention, the inclination angle of the prepared slope surface can be very small, the preparation process is simple, and the preparation flexibility of the slope surface is improved.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of micro-electro-mechanical systems, and in particular, to a method for manufacturing a rotating structure and the rotating structure. Background technique [0002] In the field of microelectromechanical systems, rotating structures can be applied to wavefront correction of adaptive optics, spatial light modulation, alignment of optical elements, micromanipulators, optical switches, optical attenuators, and optical multiplexers. [0003] According to the different driving methods of the rotating structure, it is mainly divided into: electromagnetic drive, electrothermal drive, piezoelectric drive and electrostatic drive. Electromagnetic driving uses the magnetic force generated by electromagnets or permanent magnets as the driving force. The driving current of this driving method is large, the energy consumption is large, and the manufacture of magnetic films and the application of exte...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00B81C3/00B81B5/00
CPCB81B5/00B81B2201/04B81B2203/0323B81C1/00198B81C1/00539B81C3/001
Inventor 焦继伟刘京费跃陈思奇
Owner SIWAVE INC
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