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Dielectric constant testing method, dielectric constant testing device and related equipment

A technology of dielectric constant and testing method, which is applied in the field of workpiece measurement, and can solve problems such as the error of the dielectric constant test result of the aluminum oxide layer and the test that affects the dielectric constant of the aluminum oxide layer.

Inactive Publication Date: 2020-06-16
YANGTZE MEMORY TECH CO LTD
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Problems solved by technology

However, during the process of depositing the aluminum oxide layer on the surface of the silicon substrate, an uncontrollable silicon oxide layer is usually generated between the aluminum oxide layer and the surface of the silicon substrate, which affects the test of the dielectric constant of the aluminum oxide layer, resulting in There is an error in the test results of the dielectric constant

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  • Dielectric constant testing method, dielectric constant testing device and related equipment
  • Dielectric constant testing method, dielectric constant testing device and related equipment
  • Dielectric constant testing method, dielectric constant testing device and related equipment

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Embodiment Construction

[0050] The following are preferred embodiments of the application. It should be pointed out that for those skilled in the art, without departing from the principle of the application, some improvements and modifications can also be made, and these improvements and modifications are also considered as the present invention. The scope of protection applied for.

[0051] Please refer to figure 1 , figure 1 It is a process flow diagram of the testing method provided in the first embodiment of the present application. In this embodiment, the testing method includes S100, S200, S300, S400, and S500. Among them, the details of S100, S200, S300, S400, and S500 are as follows.

[0052] S100, providing a workpiece to be measured, the workpiece to be measured includes a substrate and a portion to be measured, the portion to be measured is arranged on one side of the substrate, and the portion to be measured includes a first layer to be measured and a second layer to be measured , the...

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Abstract

The application provides a dielectric constant testing method, a dielectric constant testing device and related equipment. The testing method comprises the steps: providing a to-be-measured workpiececomprising a base body and a to-be-measured part that is arranged on one side of the base body and comprises a first to-be-measured layer and a second to-be-measured layer; acquiring a first optical thickness and a first equivalent oxide layer thickness of the first to-be-measured layer; and acquiring a second optical thickness and a second equivalent oxide layer thickness of the to-be-measured part; acquiring a first dielectric constant of the first to-be-measured layer; and establishing a dielectric constant model of the second to-be-measured layer according to the first optical thickness, the first equivalent oxide layer thickness, the second optical thickness, the second equivalent oxide layer thickness and the first dielectric constant, and calculating a second dielectric constant ofthe second to-be-measured layer. After additionally arranging the first to-be-measured layer, uncontrollable factor interference can be avoided; and the second dielectric constant of the second to-be-measured layer is accurately calculated through cooperation of the first to-be-measured layer and the second to-be-measured layer.

Description

technical field [0001] The application belongs to the technical field of workpiece measurement, and in particular relates to a method for testing a dielectric constant, a testing device, and related equipment. Background technique [0002] At present, the dielectric constant of the aluminum oxide layer is usually measured by depositing the aluminum oxide layer on the surface of the silicon substrate. However, during the process of depositing the aluminum oxide layer on the surface of the silicon substrate, an uncontrollable silicon oxide layer is usually generated between the aluminum oxide layer and the surface of the silicon substrate, which affects the test of the dielectric constant of the aluminum oxide layer, resulting in There is an error in the test results of the dielectric constant. Contents of the invention [0003] In view of this, the first aspect of the present application provides a method for testing the dielectric constant, the test method comprising: ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01R27/26
CPCG01R27/2617
Inventor 马红霞王秉国
Owner YANGTZE MEMORY TECH CO LTD