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A Synchrotron Radiation X-ray Double Mirror

A double-mirror, X-ray technology, applied in the application of diffraction/refraction/reflection processing, radiation/particle processing, nuclear engineering, etc., can solve the problems of beam direction and intensity fluctuations, high-precision experiments, etc., to improve Stability, the effect of improving the higher harmonic rejection ratio

Active Publication Date: 2022-03-22
INST OF HIGH ENERGY PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because the vibration of the deflection mirror will cause the fluctuation of the beam direction and intensity, which is unfavorable for high-precision experiments

Method used

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  • A Synchrotron Radiation X-ray Double Mirror
  • A Synchrotron Radiation X-ray Double Mirror
  • A Synchrotron Radiation X-ray Double Mirror

Examples

Experimental program
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Embodiment Construction

[0020] Such as figure 2 As shown, a synchrotron radiation X-ray double reflection mirror includes two plane deflection mirrors, and the two plane deflection mirrors are assembled at a fixed angle on an adjustment bracket inside the mirror. The two deflecting mirrors share a cooling system. The two deflecting mirrors are arranged opposite to each other and the two sides in contact are fixed and locked; the angle between the two deflecting mirrors is larger than the angle between the incident light and the surface of the first mirror. The pitch angle rotation axis of the adjustment bracket coincides with the intersection line of the two deflection mirrors.

[0021] When the biplane mirror is pressed image 3 Arranged in the way shown and installed in the mirror box, the angle between the two mirror surfaces is α, the angle between the incident light (ray 1) and the first mirror surface is θ (mirror projection angle), when the mirror is long enough , then under the condition ...

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Abstract

The invention discloses a synchrotron radiation X-ray double reflection mirror, which comprises two plane deflection mirrors, and the two plane deflection mirrors are assembled at a fixed angle on an adjustment bracket inside the reflection mirror. The two deflecting mirrors share a cooling system. The two deflecting mirrors are arranged opposite to each other and the two sides in contact are fixed and locked; the angle between the two deflecting mirrors is larger than the angle between the incident light and the surface of the first mirror. The pitch angle rotation axis of the adjustment bracket coincides with the contact sides of the two deflection mirrors. The invention increases the deflection angle of the reflected light, facilitates the blocking of bremsstrahlung, and improves the high-order harmonic suppression ratio and the stability of the beam angle. The double reflectors are fixed on a single adjustment mechanism, and the shaking of the projection angle of the mirror does not change the angle of the outgoing light; the invention can adjust the flux of the beam, and can continuously adjust the flux of the outgoing beam without changing the optical path by adjusting the projection angle of the mirror, which is suitable for According to the needs of different samples for different light intensities.

Description

technical field [0001] The invention relates to the technical field of X-ray radiation devices, in particular to a synchrotron radiation X-ray double reflection mirror. Background technique [0002] X-rays are a common probe for studying the structure of matter. Using high-intensity, highly collimated synchrotron radiation as the X-ray source can improve the time resolution and spatial resolution of material structure analysis. Plane mirrors are commonly used optical elements in synchrotron radiation devices (such as figure 1 As shown), its main functions include: reflecting synchrotron radiation light, making it deviate from and changing the optical path, avoiding the straight-through bremsstrahlung (bremsstrahlung); suppressing high-order harmonics, and slowing down the heat load. [0003] For light sources with low beam horizontal divergence, a plane deflection mirror can be placed laterally on the beamline to achieve horizontal deflection of the beam. Horizontal refle...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G21K1/06
CPCG21K1/06G21K1/067
Inventor 贾全杰李志宏杨福桂李明
Owner INST OF HIGH ENERGY PHYSICS CHINESE ACAD OF SCI