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A substrate holder and a method of manufacturing a device

A holder and substrate technology, which can be used in semiconductor/solid-state device manufacturing, holding devices and instruments using electrostatic attraction, etc., and can solve problems such as reducing focusing accuracy.

Active Publication Date: 2020-07-03
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Deformation of the substrate holder can cause problems such as reduced accuracy of focusing

Method used

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  • A substrate holder and a method of manufacturing a device
  • A substrate holder and a method of manufacturing a device
  • A substrate holder and a method of manufacturing a device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0054] figure 1 A lithographic apparatus according to an embodiment is schematically depicted. The equipment includes:

[0055]- an illumination system (illuminator) IL configured to condition a radiation beam B (eg UV radiation or DUV radiation);

[0056] - a support structure (eg mask table) MT configured to support a patterning device (eg mask) MA and connected to a first positioner PM configured to to accurately position the patterning device MA according to several parameters;

[0057] - a support table, such as a sensor table for supporting one or more sensors or a substrate support device 60 configured to hold a substrate (e.g., a resist-coated production substrate) W, said support table is connected to a second positioner PW configured to accurately position the surface of the stage (eg, the surface of the substrate W) according to several parameters; and

[0058] - a projection system (e.g. a refractive projection lens system) PS configured to project the pattern ...

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Abstract

There is disclosed a substrate holder, a method of manufacturing this substrate holder and a lithographic apparatus comprising this substrate holder. In one arrangement, there is provided a substrateholder for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder (WT) comprises a main body (40), a plurality of burls anda coating (23). The main body has a substrate-facing face (41). The plurality of burls protrude from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. Thedistal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face comprises an arrangement of areas (42,43). Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European application 17200605.8 filed on November 8, 2017, the entire content of said application being incorporated herein by reference. technical field [0003] The present invention relates to a substrate holder, a lithographic apparatus, a device manufacturing method and a method of manufacturing a substrate holder. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually on a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to create the circuit pattern to be formed on the individual layers of the IC. The pattern may be transferred onto a target portion (eg comprising a portion, one or several dies) on a substrate (eg a silicon wafer). ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/683H01L21/687
CPCG03F7/707G03F7/70708G03F7/70783H01L21/6838H01L21/6875H01L21/6831H01L21/68735H01L21/68757H02N13/00G03F7/70716
Inventor T·波耶兹S·阿成达J·布坎贝格蒂A·A·索图特
Owner ASML NETHERLANDS BV