Initial array substrate and manufacturing method and detection method thereof
A manufacturing method and array substrate technology, applied in semiconductor/solid-state device manufacturing, semiconductor/solid-state device testing/measurement, electrical components, etc., can solve problems such as shortened life of display panels
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[0127] In this embodiment, the first test conductive pattern RS_1, the second test conductive pattern RS_2, the third test conductive pattern RS_3, the first test conductive pattern RS_1, the second test conductive pattern RS_2 are set in the test conductive layer of the detection area. , The position distribution of the third test conductive pattern RS_3 is as follows Figure 9As shown, wherein the first test conductive pattern RS_1, the second test conductive pattern RS_2, and the third test conductive pattern RS_3 have the same shape. As an optional implementation, the first test conductive pattern RS_1, the second test conductive pattern RS_2, and the third test conductive pattern RS_3 are made as wire windings, and the first test conductive pattern RS_1, the second test conductive pattern RS_2, the third test conductive pattern The wire winding pattern of the third test conductive pattern RS_3, the length and cross-sectional area of the wire winding are equal, and RS_1 ...
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