Valve self-cleaning control method with position feedback
A control method and self-cleaning technology, applied in cleaning methods and utensils, chemical instruments and methods, valve devices, etc., can solve problems such as inaccurate trigger conditions, excessive cleaning, and inability to clean valves, so as to avoid excessive cleaning and reduce wear , Optimize the effect of trigger conditions
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[0022]In order to make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be described clearly and completely in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of the embodiments of the present invention, but not all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.
[0023]In some embodiments, the present invention provides a valve self-cleaning control method with position feedback, by obtaining the reference voltage value of the valve fully closed position; obtaining the current self-learning voltage value of the valve; obtaining the reference voltage value and the The difference of the current sel...
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