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Heat treatment system with temperature non-uniformity control

A technology of heat treatment system and treatment chamber, which is applied in the field of heat treatment system and can solve problems such as workpiece abnormality

Active Publication Date: 2022-05-27
베이징이타운세미컨덕터테크놀로지컴퍼니리미티드 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, non-uniformity in the temperature distribution associated with the workpiece can develop as the heat source heats the workpiece, resulting in abnormalities in the workpiece

Method used

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  • Heat treatment system with temperature non-uniformity control
  • Heat treatment system with temperature non-uniformity control
  • Heat treatment system with temperature non-uniformity control

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Embodiment Construction

[0018] Reference will now be made in detail to the embodiments, one or more examples of which are illustrated in the accompanying drawings. Each example is provided by way of explaining the embodiment and not limiting the present disclosure. In fact, it will be apparent to those skilled in the art that various modifications and variations of the embodiments can be made without departing from the scope or spirit of the present disclosure. For example, features shown or described as part of one embodiment can be used with another embodiment to yield a further embodiment. Accordingly, aspects of this disclosure are intended to cover such modifications and variations.

[0019] Exemplary aspects of the present disclosure relate to thermal processing systems. A thermal processing system in accordance with the present disclosure may define a processing chamber configured to accommodate a workpiece. In some embodiments, the workpiece may be a semiconductor wafer. It should be unde...

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Abstract

The present disclosure provides a heat treatment system. The thermal processing system may include a processing chamber and a workpiece disposed within the processing chamber. The heat treatment system may include a heat source configured to emit light toward the workpiece. The thermal processing system may also include a tunable reflective array disposed between the workpiece and the heat source. The tunable reflective array may include a plurality of pixels. Each pixel of the plurality of pixels may include an electrochromic material configurable into a translucent state or an opaque state. When the electrochromic material of a pixel is configured in a translucent state, light at least partially passes through the pixel. Conversely, transmission of light through the pixel is reduced when the electrochromic material of the pixel is configured in the opaque state.

Description

[0001] priority claim [0002] This application is based on, and claims priority to, US Provisional Application No. 62 / 818,194, filed March 14, 2019, entitled "Heat Treatment System with Temperature Non-Uniformity Control," which is hereby incorporated by reference Incorporated herein. This application is also based on, and claims priority to, US Provisional Application No. 62 / 841,340, filed May 1, 2019, entitled "Heat Treatment System with Temperature Non-Uniformity Control," which was granted Incorporated herein by reference. technical field [0003] The present disclosure generally relates to thermal processing systems. Background technique [0004] The thermal processing system may define a processing chamber configured to receive a workpiece, such as a semiconductor wafer. The thermal processing system may also include a heat source (eg, a heat lamp) configured to heat the workpiece. However, the non-uniformity of the temperature distribution associated with the wor...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67G02F1/15G01J5/48G01K13/00H01L37/02
CPCH01L21/67115H01L21/67248H05B3/0047G02F1/15H01L22/26H01L21/268B23K26/066B23K26/034H05B2203/032B23K2101/40G02F1/157
Inventor 杨晓晅陈贞安
Owner 베이징이타운세미컨덕터테크놀로지컴퍼니리미티드
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