Dedusting and filtering system of single crystal furnace, control method of dedusting and filtering system and single crystal furnace assembly

Abstract

The invention discloses a dedusting and filtering system of a single crystal furnace. The dedusting and filtering system comprises a plurality of dedusting devices, a gas storage device, a first vacuum device and a second vacuum device, each dedusting device is provided with a first gas inlet pipeline, each first gas inlet pipeline is suitable for communicating with an exhaust port of the single crystal furnace, the gas storage device is provided with a gas outlet pipeline, each dedusting device communicates with the gas storage device through a gas outlet pipeline, a second switch valve is arranged on each gas outlet pipeline, a first vacuum pipeline is arranged on the first vacuum device, each dedusting device communicates with the first vacuum device through the first vacuum pipeline, and a second vacuum pipeline is arranged on the second vacuum device. Each dedusting device communicates with the second vacuum device through the second vacuum pipeline. According to the dedusting and filtering system of the single crystal furnace, dedusting treatment on the dedusting devices is conveniently achieved, the dedusting devices are effectively prevented from being blocked, and the crystal growth process of the single crystal furnace is not affected.

Description

technical field [0001] The invention relates to the technical field of crystal growth, in particular to a dust removal and filtering system of a single crystal furnace, a control method thereof, and a single crystal furnace assembly. Background technique [0002] With the vigorous development of technology in semiconductor-related fields, the current single crystal growth furnace has a feeding capacity of 450kg, and the drawn crystals have developed in the direction of large diameter and long length. The entire crystal growth cycle can be as long as one week. , The dust generated during the crystal growth process will leave the furnace chamber together with the gas under the vacuum pump, and the dust will be filtered out by the filter element when passing through the dust removal tank. During the week-long growth process, the process of the dust removal device will not be opened, and the dust will slowly accumulate on the filter element, blocking the filter element holes, ca...

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Problems solved by technology

During the week-long growth process, the process of the dust removal device will not be opened, and the dust will slowly accumulate on the filter element, blocking the filter element holes, causing clogging problems, and causing the pressure in the growth chamber of the single crystal furnace to rise. Crystal growth has an impact, on the other hand, it may cause safety accidents

[0003] In the related art, the means of dust removal for the dust removal device are relatively limited. For example, the method of increasing the dust removal area and delaying the clogging time is used to stabilize the pressure of the growth chamber. The large production site brings inconvenience in use, and increasing the dust removal area only delays the clogging time, and cannot fundamentally solve the clogging problem

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