Process for producing layer with mixed solvent system
A technology of solvents and organic solvents, applied in the field of manufacturing semiconductor devices, can solve problems such as difficulty
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Embodiment 1
[0165] Example 1: Solvents comprising toluene and butylamine
[0166] A solvent comprising a 50:50 v / v mixture of butylamine / toluene was prepared. PbI 2 and methylammonium iodide are dissolved in a mixed solvent to form a precursor composition. The precursor composition is then used to form perovskite thin films. figure 1 The current-voltage characteristics of devices including perovskite films deposited from mixed butylamine / toluene solvents are shown. figure 2 Absorption curves of perovskite films deposited from butylamine / toluene solvents are shown. Perovskites deposited from this butylamine / toluene solvent have MA n-1 BA 2 Pb n I 3n+1 Crystal structure.
Embodiment 2
[0167] Example 2: Solvents including Toluene, Butylamine and Methylamine
[0168] Preparation of precursor solution
[0169] Methyl ammonium iodide (Dyesol company) and PbI 2 (TCI Chemical Co.) was added to 3 ml of toluene to form a 1M solution. Sonicate the vial until a dark gray suspension is obtained. A solution of methylamine (MA) in ethanol (Sigma Aldrich, 33 wt%) was placed in an aerator kept in an ice bath. Carrier gas (N 2 ) to degas the MA solution. In direct bubbling including perovskite precursors (methylammonium iodide and PbI 2 ) in toluene (Sigma Aldrich), the generated MA gas was passed through a drying tube filled with desiccant (anhydrous calcium sulfate (Drierite) and CaO). Gas was bubbled through the dark gray dispersion for 5 minutes, after which 500 [mu]l of butylamine (Sigma Aldrich) was added to the dispersion. After the addition of butylamine, a clear yellow solution was obtained, after which toluene was added to the solution so that the final mo...
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