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Showerhead for deposition tools having multiple plenums and gas distribution chambers

A gas filling part and nozzle technology, applied in the field of deposition tools, can solve problems such as gas condensation, uneven distribution, and defects in the processed substrate

Pending Publication Date: 2021-09-10
LAM RES CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During deposition, these contaminants could potentially be released into the processing chamber, causing defects on the processed substrate
Third, it is difficult to uniformly circulate gas and / or vapor through complex staggered drilling patterns
Consequently, process and / or reactant gases and / or vapors may not be evenly distributed when distributed over the substrate surface
Fourth, condensation of gases distributed via a staggered borehole network may also occur

Method used

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  • Showerhead for deposition tools having multiple plenums and gas distribution chambers
  • Showerhead for deposition tools having multiple plenums and gas distribution chambers
  • Showerhead for deposition tools having multiple plenums and gas distribution chambers

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Embodiment Construction

[0022] The application will now be described in detail with reference to some non-exclusive embodiments thereof as shown in the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present disclosure. It will be apparent, however, to one skilled in the art that the present disclosure may be practiced without some or all of these specific details. In other instances, well known process steps and / or structures have not been described in detail in order not to unnecessarily obscure the present disclosure.

[0023] refer to figure 1 , which shows a diagram of an exemplary chemical vapor deposition (CVD) tool 10 . The CVD tool 10 includes a processing chamber 12 , a showerhead 14 , a substrate holder 16 for holding and positioning a substrate 18 to be processed, and a radio frequency (RF) generator 20 . In various embodiments, the CVD tool 10 can be plasma enhanced (PECVD), low pressure (...

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Abstract

A deposition tool including a processing chamber, a substrate holder for holding a substrate to be processed within the processing chamber and a showerhead having a faceplate for distributing a first and / or second gas(es) and / or vapor(s) into the processing chamber. The showerhead includes first and second plenums, first and second chambers, each provided behind a backside of the faceplate, and first and second sets of holes, both formed through the faceplate of the showerhead, and in fluid communication with the first and second chambers respectively.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of priority to US Application No. 62 / 800,055, filed February 1, 2019, which is hereby incorporated by reference for all purposes. technical field [0003] The present invention relates to deposition tools for depositing thin films on substrates, and more particularly to showerheads for deposition tools having multiple chambers each capable of distributing gases and / or vapors into process chambers without A complex distribution network requiring staggered boreholes inside the sprinkler head. Background technique [0004] Various types of tools are commonly used to deposit various thin films on substrate surfaces such as semiconductor chips, flat panel displays, and / or photovoltaic devices. With such tools, a substrate to be processed is placed into a processing chamber. A showerhead located in the processing chamber supplies a combination of (a) reactant chemical gases and / or vapors...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/455
CPCC23C16/45565C23C16/4485C23C16/4557C23C16/45574H01J37/3244H01J37/32449C23C16/45561C23C16/45591C23C16/50H01J2237/3321
Inventor 迈克尔·J·雅尼基柯蒂斯·W·贝利
Owner LAM RES CORP