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Pattern projection equipment

A technology of projection equipment and patterns, which is applied in the direction of instruments, projection devices, optics, etc., can solve the problems of large volume and unclear edges of projected patterns, and achieve the advantages of short overall length, improved edge unclearness, and reduced distortion and aberration Effect

Active Publication Date: 2021-11-05
BEIJING ASU TECH CO LTD
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  • Claims
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Problems solved by technology

[0004] The purpose of the embodiments of the present application is to provide a pattern projection device to solve the problems of the existing pattern projection device being bulky and the edges of the generated projected patterns not clear

Method used

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Embodiment Construction

[0036] The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art based on this application belong to the scope of protection of this application.

[0037] In order to solve the problems that the existing pattern projection device is bulky and the edges of the generated projected patterns are not clear, an embodiment of the present application provides a pattern projection device. The pattern projection device provided by the present application will be described in detail below with reference to the accompanying drawings.

[0038] Such as figure 1 As shown, a pattern projection device provided by an embodiment of the present applica...

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Abstract

The embodiment of the invention provides pattern projection equipment. The pattern projection equipment comprises a collimation light source assembly and a double-layer microlens array structure, wherein the collimation light source assembly is configured to generate parallel incident light; the double-layer microlens array structure comprises a micropattern source, a first microlens array and a second microlens array, wherein the first microlens array and the second microlens array are arranged in parallel at an interval; the first micro lens array is located between the collimation light source assembly and the second micro lens array; the micro-pattern source and the first micro-lens array are oppositely arranged; each of the first micro lens array and the second micro lens array comprises a plurality of sub-lenses; the micro-pattern source comprises a plurality of micro-patterns, the micro-patterns correspond to the sub-lenses of the first micro-lens array and the sub-lenses of the second micro-lens array in a one-to-one mode, and all the micro-patterns are overlapped at the same designated position after being imaged through the corresponding sub-lenses. According to the scheme, the size of the existing pattern projection equipment can be reduced, and the problem that the edge of the generated projection pattern is not clear is solved.

Description

technical field [0001] The present application relates to the technical field of pattern display, in particular to a pattern projection device. Background technique [0002] With the development of digital technology, today's society has entered the multimedia age. In the multimedia era, pattern projection has been widely used in all aspects of life. For example, pattern projection is not only applied to daily car distance warning, car interactive instructions, theater instructions, welcome and other instruction guidance scenes, but also often used in urban night scene layout and other scenes to enhance visual experience. [0003] At present, existing pattern projection equipment usually adopts traditional lenses and pattern shielding sheets to realize pattern projection. However, the pattern projection device using this method has the problems of large volume and unclear edges of projected patterns. Contents of the invention [0004] The purpose of the embodiments of t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03B21/14G03B21/20
CPCG03B21/14G03B21/208G03B21/2013G03B21/2033G03B21/206
Inventor 林冬风张涛郭宁
Owner BEIJING ASU TECH CO LTD
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