System and method for laser micro-nano processing of pattern
A micro-nano processing and laser technology, applied in metal processing equipment, laser welding equipment, manufacturing tools, etc., can solve the problem of long processing time, and achieve the effect of good processing effect and time saving.
Pending Publication Date: 2021-11-12
GUANGZHOU UNIVERSITY
View PDF10 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0005] The above prior art uses point scanning to process the pixels of the picture one by one, so when there are too many pixels in the picture, the processing time may be too long
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0025] The present invention will be further described below in conjunction with drawings and embodiments.
[0026] see figure 1 , one A system for laser micro-nano processing graphics, including: a solid laser micro-nano processing platform and a host computer. The solid laser micro-nano processing platform includes a femtosecond laser 1, an optical gate 2, a half-wave plate 3, a Glan prism 4, and a first rectangular Mirror 5, second right-angle mirror 6, third right-angle mirror 7, lens 8 and three-dimensional displacement stage 9; femtosecond laser 1, optical gate 2, half-wave plate 3, Glan prism 4, right-angle mirror and the first The right-angle reflector 5 is arranged successively on the same horizontal axis, the first right-angle reflector 5 and the second right-angle reflector 6 are arranged on the same vertical axis, and the reflecting surfaces of the first right-angle reflector 5 and the second right-angle reflector 6 are parallel , the second right-angle reflecto...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention discloses a system and a method for laser micro-nano processing of a pattern. The method comprises the steps of automatically carrying out graying processing of a pattern to be processed, and extracting the gray value of each pixel point; comparing the gray value of each pixel point of the pattern to be processed with a preset gray threshold value, and judging whether each pixel point needs to be processed or not; performing line scanning on the pattern to be processed, and integrating points with the same to-be-processed state in the same row / column into a line segment; and finally sending all line segment information integrated in the row / column to an upper computer, and controlling an entity laser micro-nano processing platform to process the pattern to be processed on a sample by means of the upper computer. According to the method and the system, a line scanning processing mode is adopted, whether each pixel point of the pattern to be processed needs to be processed or not can be automatically calculated, and the to-be-processed states of the adjacent pixel points are compared, so that the target range between the pixel points is a laser continuous processing mode, a set of processing scheme which saves more time is obtained, and the processing effect is better.
Description
technical field [0001] The invention relates to the technical field of micro-nano processing, in particular to a system and method for laser micro-nano processing graphics. Background technique [0002] There are serious precision problems in traditional mechanical lathe processing. With the continuous development of laser technology, laser processing technology has gradually been valued by people because of its advantages such as high precision and convenient processing, and it is becoming faster and faster at an extremely fast speed. Develop in a more precise and convenient direction. At present, research on the microstructure of materials is one of the most popular directions in the field of scientific research. In view of the fact that ultrafast lasers have relatively little additional impact on material processing, micro-nano processing technologies based on ultrafast lasers are also being continuously improved and innovated. [0003] One of the most important steps in...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/064B23K26/03B23K26/36
CPCB23K26/064B23K26/0643B23K26/0648B23K26/0652B23K26/032B23K26/36
Inventor 张成云曹毓竣郭浩民
Owner GUANGZHOU UNIVERSITY