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Exhaust system of deposition reaction cavity and thin film deposition equipment

A deposition reaction and exhaust system technology, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of clogging the vacuum pump and increase the risk of clogging the vacuum pump, so as to facilitate the vacuum pump and reduce the risk of clogging the vacuum pump , Low risk of clogging

Pending Publication Date: 2022-04-15
LONGI SOLAR TECH (TAIZHOU) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, the dust entering the vacuum pump will block the vacuum pump after a long period of accumulation.
The precursor gas will carry residual raw materials into the vacuum pump and react with water vapor to generate dust, further increasing the risk of clogging the vacuum pump

Method used

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  • Exhaust system of deposition reaction cavity and thin film deposition equipment

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Embodiment Construction

[0023] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application, and are not intended to limit the present application.

[0024] It should be noted that when an element is referred to as being “fixed” or “disposed on” another element, it may be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0025] In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specify...

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Abstract

The invention discloses an exhaust system of a deposition reaction cavity and thin film deposition equipment, and relates to the technical field of thin film deposition, and the exhaust system has the beneficial effects of long maintenance period and low blocking risk. The exhaust system of the atomic layer deposition reaction cavity comprises a first exhaust pipe, a dust removal device and a vacuum pump, the two ends of the first exhaust pipe communicate with the reaction cavity and the dust removal device correspondingly, and an outer medium inlet is formed in the pipe wall of the first exhaust pipe and used for introducing a reaction medium; the reaction medium can react with a gaseous reactant in the first exhaust pipe to generate a dust-like substance; the vacuum pump communicates with a gas outlet of the dust removal device.

Description

technical field [0001] The present disclosure relates to the technical field of atomic layer deposition, in particular to an exhaust system of a deposition reaction chamber and thin film deposition equipment. Background technique [0002] Atomic layer deposition (atomic layer deposition, Atomic Layer Deposition) technology has many advantages in thin film deposition, such as precise thickness control, excellent step coverage, uniform chemical composition, and less impurities. The atomic layer deposition equipment includes a reaction chamber, an intake system and an exhaust system. The exhaust system includes a vacuum pump and an exhaust pipe connected between the vacuum pump and the reaction chamber. Under the action of the vacuum pump, the exhaust pipe and the reaction chamber can be kept in a negative pressure state to meet the process requirements of forming an atomic layer in the reaction chamber. [0003] When performing atomic layer deposition, the exhaust pipe and t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/455C23C16/54C23C16/20C23C16/18
Inventor 林健赵继财李绍鹏肖政焦龙生李鹏王建波
Owner LONGI SOLAR TECH (TAIZHOU) CO LTD
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