Miniature LED chip, preparation method thereof and eutectic structure comprising miniature LED chip
A LED chip, miniature technology, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems that the positive and negative electrodes are not on the same plane, the metal eutectic point of the negative electrode and the positive electrode are not on the same plane, and the eutectic effect cannot be achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2022-05-13
Smart Images

Figure 1
Abstract
Description
technical field
[0001] The patent of the present invention belongs to the field of micro-LED technology, and specifically relates to a micro-LED chip, a preparation method thereof, and a eutectic structure containing it. Background technique
[0002] Micro LED display technology refers to a display technology that uses self-luminous micron-scale LEDs as light-emitting pixel units and assembles them on the drive panel to form a high-density LED array. Due to the small size of the micro LED chip, high integration and self-illumination, compared with LCD and OLED in terms of display, it has greater brightness, resolution, contrast, energy consumption, service life, response speed and thermal stability. The advantages.
[0003] Micro LED applications will expand from flat panel display to AR / VR / MR, space display, flexible transparent display, wearable / implantable optoelectronic devices, optical communication / optical interconnection, medical detection, smart car lights and many ...
Examples
Embodiment 1
[0057] refer to figure 1 . The micro-LED chip of this embodiment includes a substrate 1, and a U-type gallium nitride layer 2, an N-type gallium nitride layer 3, a light-emitting layer 4, and a P-type gallium nitride layer extending outward from one side of the substrate 1 in sequence. Gallium nitride layer 5; the surface of the P-type gallium nitride layer 5 has a first groove 6 and a second groove 7 formed concavely and deep into the N-type gallium nitride layer 2, the first groove The periphery of 6 is a first protrusion 8, and the inner ring of the first groove 6 is a plurality of second protrusions 9, and the plurality of second protrusions 9 are separated by the second groove 7; the P-type nitride There is an insulating layer 10 on the gallium layer 5, the insulating layer 10 has a first opening 11 at the first groove 6, and the insulating layer 10 has a second opening 12 at the second protrusion 9; There is an N electrode layer 13 at the first opening 11, which is in ...