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Charged particle microscope system and clustering process for high dynamic range sample analysis

A charged particle microscope and charged particle technology, applied in the direction of material analysis, material analysis, image analysis, etc. using wave/particle radiation, can solve the problem that parameters cannot be selected in advance

Pending Publication Date: 2022-07-19
FEI CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the composition of the sample in EDS is usually unknown, it is not possible to preselect the parameters of the charged particle microscope that generates the initial image of the sample so that the user / algorithm can easily determine the best mode for the illumination position

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  • Charged particle microscope system and clustering process for high dynamic range sample analysis
  • Charged particle microscope system and clustering process for high dynamic range sample analysis
  • Charged particle microscope system and clustering process for high dynamic range sample analysis

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Embodiment Construction

[0017] Methods and systems are disclosed for high dynamic range (HDR) charged particle analysis using a clustering process. More specifically, the present disclosure includes methods and systems for generating HDR charged particle microscopy data structures using a plurality of images and / or image data instances. The method and system can then determine one or more characteristics of the sample based on the HDR charged particle microscopy data structure. The plurality of images and / or image data instances may be acquired by the charged particle microscope system in parallel, sequentially, or a combination thereof. Each image / example was acquired by a charged particle microscope system with a different set of charged particle microscope parameters. In various embodiments, parameter differences between individual images / image data instances may include one or more of contrast differences, brightness differences, beam intensity differences, beam type differences, gamma differenc...

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Abstract

Methods and systems for high dynamic range (HDR) charged particle analysis using a clustering process include accessing a plurality of image data instances of a region of a sample, wherein each image data instance is captured with a different parameter by a charged particle microscope. The parameter difference may include one or more of a contrast difference, a brightness difference, a beam intensity difference, a beam type difference, a gamma difference, and / or a combination thereof. Then, an HDR charged particle microscopy data structure is generated using the captured image data, and one or more features of the sample are identified based on the HDR charged particle microscopy data structure. In some methods according to the invention, the methods further comprise performing an EDS analysis on the sample based on the determined one or more identified features.

Description

Background technique [0001] In charged particle imaging, an area of ​​a sample is illuminated with a beam of charged particles (eg, an electron beam), and an image of the area is generated based on the emission generated by the sample as a result of the illumination. For example, in electron imaging, an area of ​​a sample is illuminated with an electron beam, imaging data is generated based on emissives (eg, backscattered electrons) emitted by the sample in response to such illumination, and used to generate images of the area of ​​the sample. Since different elements / molecules generate different characteristic emissions, charged particle microscopy systems are able to generate sample regions by scanning the charged particle beam across the surface of the sample and assigning pixel values ​​to each pixel of the image based on the emission from the corresponding portion of the sample Image. [0002] However, despite having very different chemical compositions, current charged ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/00G01N23/20091G01N23/2251G06T7/11G06T7/70G06K9/62G06V10/762
CPCG01N23/00G01N23/20091G01N23/2251G06T7/11G06T7/70G01N2223/401G01N2223/102G06F18/23G06T7/10G06T2207/10056G06T2207/10116G06V20/695G06V10/462G06T5/50G06T2207/10061G06T2207/20208G06T5/92
Inventor M·J·欧文C·莱维恩G·豪厄尔T·图马
Owner FEI CO