Free-radical polymerised compound

Abstract

A radical polymerizable compound comprising a structure represented by the following formula (I), (II) or (III), wherein X<3> represents a heterocyclic group that is connected through a hetero atom included therein; Q<1> represents a group represented by CN or COX<2>; X<2> represents a hydroxy group, a substituted oxy group, a substituted thio group, an amino group, a substituted amino group, a heterocyclic group that is connected through a hetero atom included therein or a halogen atom; X<1> represents a substituted oxy group, a, substituted amino group, a heterocyclic group that is connected through a hetero atom included therein or a halogen atom; Z<1> and Z<2> each represents a n-valent connecting group having at least 6 carbon atoms, in which the n's connecting parts are all hetero atoms; R and R, which may be the same or different, each represents a hydrogen atom, a halogen atom, a cyano group or an organic residue; or R and R, X<1> and R or R, X<3> and R or R, or Q<1> and R or R may combine with each other to form a cyclic structure; and n represents an integer of from 2 to 6.

Description

[0001] technical field of invention [0002] The present invention relates to novel radically polymerizable compounds, and more particularly, to image-forming materials that can be used in stereolithography, holography, lithographic printing plate precursors, color masks, photoresist films, and color filters , or radically polymerizable compounds in photocurable resin materials such as inks, coatings, and adhesives. In particular, it relates to radically polymerizable compounds suitable for use in photopolymerizable compositions of lithographic printing plate precursors capable of so-called direct platemaking, which uses various lasers directly with digital signals from, for example, computers, etc. plate making. Background technique [0003] Solid-state lasers, semiconductor lasers, and gas lasers that emit ultraviolet light, visible light, or infrared light with a wavelength of 300 nm to 1200 nm with high output power and compact size are now easily available, and these las...

AI Technical Summary

Problems solved by technology

However, the formation of an oxygen barrier layer causes fogging due to dark polymerization, resulting in poor storage stability

It is difficult to have high sensitivity and storage stability at the same time, and the results that can fully satisfy this requirement have not been obtained in the prior art.

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