Damping device, flat table device and exposuring device

Abstract

In order to remove vibration or improve a vibration control effect, and achieve device size reduction, an adjusting device is provided in which a weight of a support target object is supported by a pressure of an internal gas of a first chamber gas via a holding member and which adjusts a position in a gravity direction of the holding member by driving a movable member which changes an internal volume of the first gas chamber by changing an internal volume of a second gas chamber based on a state change of at least one of first and second gas chambers. Because of this, when the holding member is displaced in the gravity direction because of the vibration or the like, as the movable member is driven by the adjusting device, the holding member is maintained at an original position. Additionally, the movable member does not contact the support target object, so it does not directly deform the support target object, and the support target object is only driven by the change of the internal volume of the gas chambers; thus, even if the rigidity of the gas within the first gas chamber is high, there will be no problem regarding transmission of vibrations.

Description

technical field [0001] The present invention relates to an anti-vibration device, a platform device, and an exposure device, and more specifically relates to an anti-vibration device that suppresses vibration while holding an object, and a table device and an exposure device including the anti-vibration device. Background technique [0002] For a long time, in the etching process used to manufacture semiconductor components and liquid crystal display components, the pattern formed on the mask or grating (hereinafter collectively referred to as “grating”) is mainly used to apply photoresist, etc. through the projection optical system. A step-and-repeat reduction projection exposure device (so-called step-and-shift exposure device) that performs transfer on substrates such as wafers or glass plates (hereinafter collectively referred to as "wafers"), and improved step-and-shift exposure devices A stepping type projection exposure apparatus such as a step and scan type scanning ...

AI Technical Summary

Problems solved by technology

Especially in this structure, the rigidity in the direction of gravity is small and the rigidity in the horizontal direction and torsional direction is strong, so it is not possible to obtain a sufficient ground vibration attenuation effect, that is, a sufficient vibration isolation effect.

[0013] In the anti-vibration device 931, high response control can be realized by using a voice coil motor (voice coil motor) 974. However, in order to maintain a large-scale device such as an exposure device, in order to use three positions or four Each position supports a weight of about 10 tons, and each position supports a weight corresponding to a mass of about 3 tons, and must move up and down. As a voice coil motor, a very large thrust is required

Therefore, the size of the voice coil motor (voice coil motor) itself will increase and the power consumption will increase.

[0014] Additionally, by Figure 17 (A), Figure 17 (B) It can be seen that in the conventional anti-vibration device, the position of the air cushion support structure and the position of the action point of the driving force of the voice coil motor (voice coil motor) deviate, so electromagnetic adjustment is performed at the same time When the internal pressure control of the air pressure chamber in the device and the position control of the object OB to be supported by the voice coil motor (voice coil motor) 974, the object OB to be supported will be deformed, and this becomes a problem for each part of the exposure device. Causes of Control Accuracy Deterioration

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