Lithographic apparatus and device manufacturing method

A lithographic projection and component technology, which is used in semiconductor/solid-state device manufacturing, photolithography process exposure devices, microlithography exposure equipment, etc. Problems such as resist T-type topping

Active Publication Date: 2005-02-02
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This causes poor performance in the upper layer of photoresist
Additionally, the non-uniform nature of the photoresist after degradation can cause T-topping during devel

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] figure 1 A lithographic projection apparatus according to a specific embodiment of the present invention is schematically shown. The devices include:

[0042] a radiation system Ex, IL, said radiation system Ex, IL for supplying a projection beam PB of radiation such as DUV (deep ultraviolet) radiation, in this particular case the radiation system Ex, IL also comprising a radiation source LA ;

[0043] a first object table (mask table) MT equipped with a mask holder for holding a mask such as a reticle and connected to the first positioning means, the aforementioned first positioning means are used to precisely position the mask relative to the object PL;

[0044] A second object stage (substrate stage) WT equipped with a substrate holder for holding a substrate (for example, a resist-coated silicon wafer) W and connected to on the second positioning device, the above-mentioned second positioning device is used for precise positioning of the substrate relative to t...

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PUM

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Abstract

A lithographic apparatus is provided. Exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.

Description

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Claims

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Application Information

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Owner ASML NETHERLANDS BV
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