Nozzle device and substrate processing device with nozzle device

Abstract

A nozzle device and a substrate processing device capable of preventing liquid from dripping after completing the application of the liquid and forming processing liquid film of uniform thickness no a substrate with small amount of processing liquid, the nozzle device comprising a plruality of outlets formed in the lower surface thereof, a liquid reserving chamber for reserving the supplied processing liquid, and a plurality of liquid discharge flow passages allowed to communicate with the outlets for discharging the processing liquid from the outlets, wherein the upper ends of the liquid discharge flow passages are positioned above the upper end of the liquid reserving chamber and the liquid discharge flow passages are allowed to communicate with the liquid reserving chamber through a communication passage, and the minimum height dimension of the communication passage is set to 0.05 to 0.2 mm and the minimum diameter of the liquid discharge flow passages is set to 0.35 to 1.0mm.

Description

technical field [0001] The present invention relates to a nozzle device for spraying processing liquids such as chemical liquid or washing liquid on liquid crystal glass substrates, semiconductor wafers (silicon wafers), glass substrates used for photomasks, substrates used for optical discs, etc. substrate processing equipment. Background technique [0002] For example, a glass substrate constituting a liquid crystal substrate is manufactured through various processes in which a protective film or a developer is applied to the glass substrate, and various treatment solutions such as a chemical solution for peeling or a cleaning solution are applied. [0003] The coating of the treatment liquid on the glass substrate is performed by the nozzle device shown in Fig. 15 and Fig. 16 . The nozzle device includes: a support mechanism for horizontally supporting the glass substrate; a nozzle device for discharging the treatment liquid onto the horizontally supported glass substrat...

AI Technical Summary

Problems solved by technology

[0015] However, in the nozzle device 100, since the discharge holes 105 are arranged in a row, if the distance between the holes is too narrow, the intervals of the liquid streams discharged from the discharge holes 105 are very close to each other. As a result, the adjacent liquid streams are joined together and mixed with each other, not only forming a ribbon-shaped liquid stream and flowing down, but also the width of the liquid stream is in a state of front-end contraction due to the effect of its surface tension, resulting in the treatment liquid cannot be coated to the problem on the entire substrate W width

In addition, there is also a problem that the thickness of the applied treatment liquid is too thick.

[0016] On the one hand, when the spacing between mounting holes is increased so that adjacent liquid streams do not stick together, since the amount of processing liquid discharged from each discharge port is too small, as shown in FIG. 17 , each liquid drop placed on the substrate W R cannot be in contact with each other and is in an independent state, so it is impossible to form a processing liquid film on the substrate W

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