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Color filter, manufacturing method thereof, electrooptical device and electronic equipment

一种制造方法、滤色片的技术，应用在光学、滤光片、光学元件等方向，能够解决难以得到润湿扩散特性等问题

Inactive Publication Date: 2006-01-11
SEIKO EPSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, it is obviously difficult to obtain sufficient wettability and diffusion characteristics by using a lyophobic photoresist to form the barrier ribs, and relying on the inherent lyophilicity of the substrate such as a glass substrate without performing a lyophilic treatment in the pixel.

Method used

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  • Color filter, manufacturing method thereof, electrooptical device and electronic equipment
  • Color filter, manufacturing method thereof, electrooptical device and electronic equipment
  • Color filter, manufacturing method thereof, electrooptical device and electronic equipment

Examples

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Embodiment Construction

[0032] Below, refer to Figure 1 to Figure 8 , embodiments of the color filter of the present invention, its manufacturing method, electro-optical device, and electronic equipment will be described.

[0033] First, a liquid crystal display device (electro-optical device) including a color filter according to the present invention will be described.

[0034] Here, an active matrix type liquid crystal device is used as an example for description.

[0035] figure 1 It shows an example of an active matrix type liquid crystal device (liquid crystal display device) using TFT as a switching element, (A) shows a perspective view of the overall configuration of the liquid crystal display device of this example, and (B) is the One pixel magnification.

[0036] exist figure 1 In the liquid crystal device (electro-optical device) 580 of this embodiment, the element substrate 574 on the side where the TFT element is formed and the counter substrate 575 are arranged facing each other, a...

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Abstract

The present invention provides a method for manufacturing a color filter having a picture element part surrounded by a partition wall and provided in the plural number on a substrate including a step of forming the partition wall that has a lyophobic quality on the substrate, step of forming a lyophilic layer in the picture element part by applying a lyophilic liquid that develops the lyophobic quality to a substantially whole surface of the substrate on which the partition wall is formed all at once and a step of applying a droplet of colorant to the picture element part in which the lyophilic layer is formed. The invention obtains a large wet spreading property in a pixel.

Description

technical field [0001] The present invention relates to a color filter, a manufacturing method thereof, an electro-optical device, and an electronic device. Background technique [0002] When manufacturing a color filter by a droplet discharge method (inkjet method), each pixel is surrounded by a partition wall called a bank, and a droplet (ink) of a pigment is continuously applied. However, at this time, there is a possibility that the liquid droplets do not wet and spread uniformly within the pixel, resulting in unevenness, or color mixing may occur across the partition walls. Therefore, lyophobicity is required for the partition wall, and high lyophilicity is required for the inside of the pixel. [0003] Therefore, in the past, the barrier ribs have been formed with a lyophobic photoresist, or as disclosed in Patent Document 1, plasma treatment with oxygen and fluorine carbon gas has been used to impart higher lyophobic properties to the barrier ribs than to the pixels,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335G02B5/20
CPCH01L27/14621H01L31/02162H01L27/14685G02B5/201G02F1/1335
Inventor 丰田直之川瀨智己
Owner SEIKO EPSON CORP