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Color filter and method for manufacturing the same, electro-optical device, and electronic apparatus

A manufacturing method and color filter technology, applied in optics, filters, optical components, etc., can solve problems such as difficulty in obtaining wetting and diffusion characteristics

Inactive Publication Date: 2006-01-11
SEIKO EPSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, it is obviously difficult to obtain sufficient wettability and diffusion characteristics by using a lyophobic photoresist to form the barrier ribs, and relying on the inherent lyophilicity of the substrate such as a glass substrate without performing a lyophilic treatment in the pixel.

Method used

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  • Color filter and method for manufacturing the same, electro-optical device, and electronic apparatus
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  • Color filter and method for manufacturing the same, electro-optical device, and electronic apparatus

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no. 1 Embodiment approach

[0070] First, if Figure 6 As shown in (a), a partition wall 706 (black matrix) is formed on one surface of a transparent substrate 742 . When forming the barrier ribs 706, a non-light-transmitting resin (preferably black resin) is applied to a predetermined thickness (for example, about 2 μm) by spin coating or the like, and patterned using photolithography. Alternatively, inkjet processing can also be used.

[0071] In addition, when using the photolithography method, it is necessary to match the surface of the partition wall by a prescribed method such as spin coating, spray coating, roll coating, die coat, dip coating, bar coat, and slit coat. A highly coated organic material, on which a resist layer is applied. Then, a mask is applied in conformity with the shape of the barrier ribs, and the resist is left in conformity with the shape of the barrier ribs by exposing and developing the resist. Finally, etching is performed to remove the barrier rib material in parts oth...

no. 2 Embodiment approach

[0085] Next, a second embodiment of the color filter manufacturing method according to the present invention will be described.

[0086] In the above-mentioned first embodiment, the coloring layer was formed after forming the lyophilic layer 710 on the entire plurality of filter element forming regions 707, but in this embodiment, each of the filter element forming regions 707 , when ejecting droplets of a lyophilic liquid, an example of the case where droplets of a coloring material are applied to the filter element forming region 707 will be described.

[0087] In the present embodiment, as the lyophilic liquid, a silica dispersion liquid (ST-K211 manufactured by Ishihara Sangyo Co., Ltd.) in which lyophilic silica fine particles are dispersed in alcohol is discharged from the droplet discharge head 1 and lands on the The filter elements are formed in the region 707 .

[0088] The silica fine particles preferably have an average diameter of 1 to 500 nm, particularly prefera...

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Abstract

The present invention provides a method for manufacturing a color filter, the color filter having a plurality of pixels surrounded by partition walls on a substrate, including: forming the partition wall having a liquid repellence on the substrate; forming a lyophilic layer by ejecting a lyophilic liquid droplet which develops a lyophilic characteristic in the pixel; and coating a coloring droplet over the pixel on which the lyophilic layer has been formed.

Description

technical field [0001] The present invention relates to a color filter, a manufacturing method thereof, an electro-optical device, and an electronic device. Background technique [0002] When manufacturing a color filter by a droplet discharge method (inkjet method), each pixel is surrounded by a partition wall called a bank, and a droplet (ink) of a pigment is continuously applied. However, at this time, there is a possibility that the liquid droplets do not wet and spread uniformly within the pixel, resulting in unevenness, or color mixing may occur across the partition walls. Therefore, lyophobicity is required for the partition wall, and high lyophilicity is required for the inside of the pixel. [0003] Therefore, in the past, the barrier ribs have been formed with a lyophobic photoresist, or as disclosed in Patent Document 1, plasma treatment with oxygen and fluorine carbon gas has been used to impart higher lyophobic properties to the barrier ribs than to the pixels,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20G02F1/1335
CPCG02F1/133516G02B5/223G02B5/201G02F1/1335
Inventor 丰田直之
Owner SEIKO EPSON CORP