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Apparatus and method for mixing and supplying chemicals

A technology for supplying devices and chemicals, applied to chemical instruments and methods, mixers, instruments, etc., which can solve problems such as complex chemical mixing and supply procedures, complex structures, and unsupported real-time mixing and supply of chemicals

Active Publication Date: 2006-03-08
SEMES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Conventional devices generally do not support real-time mixing and supply of chemicals, and have a complex configuration of two tanks and circulation lines connected to the tanks
Therefore, much time and additional installation space are required, and the mixing and supplying procedures of chemicals become complicated

Method used

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  • Apparatus and method for mixing and supplying chemicals
  • Apparatus and method for mixing and supplying chemicals
  • Apparatus and method for mixing and supplying chemicals

Examples

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Embodiment Construction

[0019] The invention will be described more fully below with reference to the accompanying drawings, in which preferred embodiments of the invention are shown. However, the present invention can be carried out in different ways and is not limited to the examples given herein. Rather, these embodiments are given so that this disclosure will be thorough, and will fully convey the scope of the invention to those skilled in the art. Like reference numerals refer to like parts throughout.

[0020] like figure 1 As shown, according to the present invention, the chemical mixing and supplying device 100 mixes a first chemical and a second chemical at a determined mixing ratio, and supplies the mixture to a processing device. The apparatus 100 includes first and second chemical source portions 112 and 122 , first and second delivery lines 114 and 124 , first and second flow meters 116 and 126 , control unit 130 and main delivery line 140 .

[0021] Shut-off valves M / V and A / V and a ...

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PUM

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Abstract

The present invention relates to apparatus and methods for mixing at least two chemicals and supplying the mixture to a substrate processing apparatus for processing a substrate with the mixture. The chemical mixing and feeding device comprises: at least two chemical source parts; delivery lines respectively connected to the chemical source parts; a main delivery line connected to the delivery lines and configured to mix the chemicals delivered by the delivery lines , and deliver the mixture to a processing device; a detector for detecting the flow rates of the chemicals respectively delivered to the delivery lines; and a control unit for comparing the flow rate data received from the detectors to control the flow rates of the chemicals.

Description

[0001] priority statement [0002] This application claims priority from Korean Patent Application No. 2004-69931 filed with the Korean Intellectual Property Office on September 2, 2004, the disclosure of which is incorporated herein by reference in its entirety. technical field [0003] The present invention relates to a device and a method for mixing at least two chemicals in a determined mixing ratio in real time and supplying the mixture. Background technique [0004] Typically, a mixture of chemicals and deionized water (DI water) or a mixture of at least two chemicals is used to remove the wafer surface in wet etching and in the cleaning process. [0005] In a conventional chemical supply device that mixes chemicals with deionized water at a determined mixing ratio and supplies the mixture to a treatment device, the chemicals are respectively supplied to a mixing tank in their determined amounts. Chemicals are supplied through an integral flow meter installed on the d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01F15/04G05D11/02
CPCG05D11/132H01L21/302H01L21/304
Inventor 张秀逸催光一赵俊贤
Owner SEMES CO LTD