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Cleaning method and device using laser exciting gas

A gas and laser technology, applied in the direction of cleaning methods and appliances, chemical instruments and methods, etc., can solve the problems of uneven substrate surface, high cost, inapplicability to cleaning large substrates, etc.

Inactive Publication Date: 2006-08-09
METAL INDS RES & DEV CENT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The object of the present invention is to provide a cleaning method and device using laser-activated gas to solve the defects of poor effect and uneven surface of the substrate when the known cleaning method and device are used to clean the substrate, and to improve the performance of the known cleaning substrate device. The disadvantage of high cost, and overcome the defect that the known substrate cleaning device cannot be applied to cleaning large substrates

Method used

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  • Cleaning method and device using laser exciting gas
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Embodiment Construction

[0025] The following are the assembly methods and implementation steps of the preferred embodiments of the present invention, which will be described in detail in conjunction with the accompanying drawings.

[0026] First, see figure 1 , a cleaning method S1 using laser-activated gas in the present invention is a method for cleaning a substrate, the cleaning method S1 of the laser-activated gas includes providing a step S10 of a substrate to be cleaned, and performing a step of spraying gas on the surface of the substrate to be cleaned S20, performing the step S30 of irradiating the surface of the substrate to be cleaned with laser light, and completing the step S40 of cleaning the substrate surface.

[0027] Furthermore, see figure 2 , a cleaning device 1 using laser-activated gas in the present invention is a device for cleaning substrates. The cleaning device 1 for laser-activated gas includes a clamping fixture 10, a substrate to be cleaned 20, and a gas generating devic...

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Abstract

This invention is a cleaning method and device of using laser activate gas. the device first provides a cleaning base board procedures, then grasps the base with surface pollution , then spaying gas on base surface procedure is done. Solid gas molecular snowflake is generated by gas generating device, and is sprayed to the base surface. Laser irradiation the cleaning base surface procedure is done when the snowflake on the surface volatilizes to gas. the snowflake accelerates its sublimation and expands to explosion when the base it irritated by laser to drive the surface pollution separated from the base. Finally, the base surface is cleared up.

Description

technical field [0001] The invention relates to a cleaning method and device using laser-activated gas, in particular to a method and device for cleaning the surface of a substrate. Background technique [0002] The known technology for cleaning substrates and the device for removing pollutants on the substrate surface uses a device that generates suspended matter and cooperates with a high-speed rotating substrate clamping device to spray the suspended matter on the surface of the substrate, and The substrate to be cleaned clamping device is clamped and rotated. When the rotation speed of the substrate is increased to high-speed rotation, the pollutants on the surface of the substrate are removed by using the high-speed rotating airflow passing over the surface of the substrate to be cleaned and the centrifugal force of high-speed rotation. To achieve the effect of cleaning the substrate to be cleaned, in addition, the known cleaning device will add a heating lamp to heat t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B7/00
Inventor 杨胜仲黄俊诚陈进和
Owner METAL INDS RES & DEV CENT