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Lithographic apparatus and device manufacturing method

A technology for lithographic projection and sealing components, which is applied in semiconductor/solid-state device manufacturing, photolithography exposure equipment, microlithography exposure equipment, etc., and can solve unpredictable and unwanted problems

Active Publication Date: 2006-08-23
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This requires additional or more powerful motors, and the turbulence of the liquid can cause unwanted and unpredictable effects

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

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Embodiment Construction

[0021] FIG. 1 schematically shows a photolithographic apparatus according to an embodiment of the present invention. The unit includes:

[0022] - an illumination system (illuminator) IL for conditioning the radiation beam B (eg UV radiation or DUV radiation).

[0023] - a support structure (e.g. mask table) MT for supporting the patterning device (e.g. mask) MA and connected to first positioning means PM for precise positioning of the patterning device according to certain parameters .

[0024] - a substrate table (e.g. wafer table) WT for supporting a substrate (e.g. resist coated wafer) W and connected to a second positioner PW for precise positioning according to certain parameters the basis; and

[0025] - A projection system (eg a refractive projection lens system) PS for projecting the pattern imparted to the radiation beam B by the patterning device MA onto a target portion C of the substrate W (eg comprising one or more dies).

[0026] The illumination system may ...

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Abstract

A seal member surrounding a space filled with liquid has a recess in its lower surface which is open to both a relative low pressure source and a relative higher pressure source and through which liquid and / or air from between said seal member and said substrate is extracted.

Description

technical field [0001] The invention relates to a lithographic apparatus and a method for manufacturing a device. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. Lithographic apparatus can be used, for example, in the fabrication of integrated circuits (ICs). In this case, a patterning device, which may be a mask or a reticle, may be used to create a circuit pattern formed on a single layer of the IC. The pattern can be transferred to a target portion (eg, comprising part of one or more dies) on a substrate (eg, a silicon wafer). Usually the transfer of the pattern is done by imaging onto a layer of radiation sensitive material (resist) on the substrate. Typically, a substrate comprises a grid of adjacent target portions patterned in sequence. Existing photolithography apparatuses include a photolithography apparatus called a stepper and a photolithography appara...

Claims

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Application Information

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IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/70341G03F7/2041G03F7/70858G03F7/70866
Inventor N·R·坎帕S·N·L·唐德斯C·A·胡根达姆N·坦凯特F·范德穆伦
Owner ASML NETHERLANDS BV
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