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Mask forming method and information recording medium manufacturing method

A mask and graphic technology, applied in the fields of mask formation and information recording media manufacturing, can solve the problems of increasing stamper manufacturing costs, mask formation costs, and mask formation costs, and achieves cost reduction and reduction The effect of manufacturing costs

Inactive Publication Date: 2007-03-14
TDK CORPARATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the formation cost of the mask increases due to an increase in the manufacturing cost of the stamper.
In this way, in the conventional mask forming method, there is a problem that the cost of mask formation increases due to the use of a light-transmitting stamper.

Method used

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  • Mask forming method and information recording medium manufacturing method
  • Mask forming method and information recording medium manufacturing method
  • Mask forming method and information recording medium manufacturing method

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Embodiment Construction

[0029] Hereinafter, the best mode of the mask forming method and the information recording medium manufacturing method of the present invention will be described with reference to the drawings.

[0030] First, an information recording medium manufacturing apparatus 50 (hereinafter referred to as "manufacturing apparatus 50") that forms a mask and manufactures an information recording medium according to the mask forming method of the present invention will be described with reference to the drawings.

[0031] The manufacturing device 50 shown in FIG. 1 includes a coating device 51, an ultraviolet irradiation device 52, a pressure device 53, and an etching device 54. While forming the mask 30 (refer to FIG. 6 ) according to the mask forming method of the present invention, by using The etching process of the mask 30 produces the information recording medium 1 shown in FIG. 2 . At this time, the manufacturing apparatus 50 forms the mask 30 using the intermediate body 10 (see FIG...

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Abstract

The invention provides a mask forming method which can reduce a mask forming cost. When the mask with an uneven pattern formed is formed on an intermediate 10, coating film forming treatment forming a paint film 31 by applying an ultraviolet curable coating liquid (radiation curable coating liquid) on the intermediate 10, ultraviolet-irradiation treatment (radiation-irradiation treatment) irradiating the paint film 31 with ultraviolet rays 52a (radiation), and pattern transfer treatment transferring the uneven pattern of a stamper to the paint film 31 by pushing an uneven pattern forming surface in the stamper to the paint film 31 are carried in turn to form the uneven pattern of the mask.

Description

technical field [0001] The present invention relates to a method of forming a mask by transferring a concavo-convex pattern of a stamper to a coating film coated on a substrate to form a mask, and to manufacturing an information recording medium using the mask formed according to the mask forming method Information recording medium manufacturing method. Background technique [0002] As such a mask forming method, a mask forming method for forming a mask used when etching a thin film formed on a substrate is disclosed in JP-A-5-80530. In this mask forming method, first, a photocurable organic resin is applied so as to cover a thin film formed on a substrate to form an organic resin layer. Next, the surface on which the concave-convex pattern is formed in a stamper made of a light-transmitting material such as polycarbonate, polymethyl methacrylate, and glass is pressed onto the organic resin layer. Next, by irradiating light through the stamper toward the organic resin laye...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11B5/84G03F7/26
CPCB82Y10/00G11B7/263G03F7/0002B29D17/00G11B5/855B82Y40/00
Inventor 海津明政大场和晴藤田实高井充
Owner TDK CORPARATION
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