Multi-layer changeable-expression mask structure
Patent Information
- Authority / Receiving Office
- US · United States
- Current Assignee / Owner
- CHEN CHI JUNG
- Publication Date
- 2006-07-06
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
BACKGROUND OF THE INVENTION
[0001] (a) Field of the Invention
[0002] The invention relates to a multi-layer changeable-expression mask structure, and more particularly, to a mask having simple operations to easily change facial expressions for reducing production costs.
[0003] (b) Description of the Prior Art
[0004] Masks are derived from singing and dancing ceremonies at sacral rituals of primitive societies. Each mask has a story behind, and may represent cultures of a specific ethnic group. Modern people use characteristics of masks for camouflage shows and performances. Masks are extensively worn by western adults in parties and during holidays—all kinds of masks are worn to mingle into jolly crowds, and real identities are hidden to free one from etiquette constraints. Speaking of masks, they can be easily created. To make a conventional mask, a piece of paper is cut to form a several holes, and a few decorative objects are attached thereon. Or, a piece of cardboard paper is fo...