An interposer uses conductive shielding structures connected to front-side vias to reduce signal interference.
A module inspection fixture uses a rotating spherical section to hold semiconductor packages for manual examination.
Angled sidewalls route electrical lines along cap surfaces to expose bonding platforms, reducing lateral space margins between bond pads and the cap edge.
A method forms rounded semiconductor conductor lines using a dielectric layer with varying etch rates to widen trenches before filling them with conductive material.
Segmented conductive layers with hollow interiors resolve the trade-off between electromagnetic performance and damage resistance during wire bonding.
Buried MEMS sandwich membranes integrate with metal interconnects to reduce fabrication complexity.
An electrically conductive deterministic lateral displacement array separates 20 nm particles by charge and size, reducing fluidic resistance.
A stacked integrated circuit uses an independent protective substrate to isolate the main circuit from pulse currents.
Forming features on a flat wafer surface before cavity etching resolves manufacturing precision challenges while reducing reflective losses.
Capacitive AC coupling decouples stacked dies via through-silicon vias, reducing power consumption and enhancing bandwidth in 3D integrated circuits.
Segmented leads with varying cross-sections reduce electrical parasitics while maintaining thermal conductivity and attachment strength.
A substrate trench houses a bridge with mixed pitch pads to electrically couple semiconductor chips, resolving manufacturing complexity from varying chip sizes.
A rare earth-doped pore sealant forms a dense diffusion barrier within interlayer dielectric trenches.
Trapezoid-shaped conductive bumps increase base contact area to boost shear strength, resolving electrical defects caused by fine-pitch bonding pad density.
Forming conductive shielding layers along trenches during wafer processing eliminates post-dicing packaging steps, reducing manufacturing time and costs.
A via-less thin film resistor connects adjacent interconnect structures laterally to reduce vertical and horizontal dimensions.
Corner pins on QFN packages boost terminal count without expanding footprint, resolving the trade-off between higher I/O density and package size.
A ring structure surrounding the TSV electrode absorbs thermal stress from CTE mismatch, preventing delamination and cracking of the semiconductor substrate.
A fan-out semiconductor package uses a redistribution layer to move connection pads outward from the chip surface.
Different materials for power, ground, and signal vias reduce resistance and capacitance to improve electrical characteristics.
A through-cavity reflector and bendable copper PCB dissipate heat from the LED chip while a resin seal protects quantum dots from moisture.
A composite dielectric layer combines silicon nitride over oxide to maintain channel stress during annealing.
Thickened leadframe central regions dissipate heat through broad bottom surfaces, reducing thermal resistance and improving light intensity.
Surrounding the die with a conductive frame and attaching a thermally conductive sheet prevents warping during manufacturing.
Forming metal terminals on non-planar passivation layers eliminates planarization steps, preventing shape abnormalities and electrical shorts.
Interlink plates with conductive patterns connect bond pads to joint pads, eliminating expensive TSV equipment and reducing manufacturing costs.
A display panel design positions a driver chip between the active area and non-display region using structural protrusions.
Protrusion e-bars in a 3D SiP guide encapsulant flow to prevent void formation while providing shielding against electromagnetic interference.
A thermal dissipation element extends parallel and perpendicular to a semiconductor die surface.
An air gap beneath a raised silicon beam isolates the eFUSE region, enabling precise temperature gradient control and reducing programming current.
A package substrate uses segmented dielectric layers to support fine interconnect geometries while maintaining structural rigidity.
Laminating a dielectric sheet fills high aspect ratio spaces between components, preventing voids and displacement while maintaining a planar surface.
Staggered dummy line patterns resolve photolithography light interference, preventing photoresist deformation and electrical shorts in semiconductor devices.
A multiple-exposure patterning technique creates unique identification marks on integrated circuit dies.
Through holes in the spacer layer receive distinct adhesive materials to prevent periphery delamination and moisture infiltration during wafer dicing.
A metallic adhesion layer coats aluminum pads before sintering conductive particles to form a robust bump base.
Parallel grooves partition the fillet region to contain low-viscosity underfill resin, preventing bleeding and delamination while improving moisture resistance.
Composite silicon and metal interconnect layers relax mechanical stress to suppress device degradation as layer counts increase.
Segmented via structure prevents collapse in package-on-package assemblies, enabling higher density integration.
A temporary protective layer isolates external terminals while an EMI shielding layer coats all semiconductor package surfaces.
A MOS transistor embedded substrate uses opposite mounting directions to simplify wiring patterns and reduce connection resistance.
A protective film shields flexible wiring substrate joints from moisture intrusion, maintaining insulation reliability in harsh environments.
Manganese segregation forms a protective layer at the copper-barrier interface, repairing defects and extending device lifespan against electromigration.
A semiconductor package design connects external antenna conductors via dedicated pins to bypass the chip island.
A semiconductor power module uses an insulated metal substrate with embedded cooling fluid channels for efficient thermal management.
A light-emitting device package uses electrically isolated electrode pairs to form independent circuits within a lead frame structure.
Patterned metallization structures on silicon carbide substrates create alternating silicide and non-silicide interface regions.
Vertical heat dissipation layers in 3D integrated circuits prevent local temperature spikes by conducting heat away from active device regions.
Conductive assembly with connecting structure provides electrical and thermal connectivity between semiconductor die terminals and external mounting surfaces.
A semiconductor package uses a frame with through vias to connect chips and conductive balls.
A monolithic conductive through via extends through multiple dielectric and circuit layers to enable high-density interconnects.
A heat dissipation module uses a magnetic field to drive powder into channels within an evaporator for working fluid circulation.
Differentiating forward ON voltages between stacked semiconductor chips allows precise detection of open or short circuits despite shared power supply lines.
A thixotropic fillet material creates an edge barrier that constrains low-viscosity underfill flow, reducing keep-out zones and package volume.
Collective fabrication of 3D electronic modules uses reconstituted plates to reduce thickness while maintaining high-frequency reliability.
A semiconductor package uses recessed interposer through electrodes to connect a die directly to external contacts.
A metal post coated with a low-wettability film extends from the tip to the side surface, enabling taller pillar bumps without solder spreading.
A low-permittivity layer within the insulating structure reduces nonlinear parasitic capacitance in semiconductor devices.
A discharge plate on the source plate bottom surface couples to a ground node via a substrate circuit to reduce electrical resistance.
Asymmetric power element arrangement reduces module size while enhancing thermal conductivity through optimized conductor foil patterns.
Nano-scale silver particles form a solid interface joining ceramic, organic, and metallic components under pressure at low temperatures.
A common control unit outputs phase-shifted clock signals to drive units, enabling arbitrary phase configuration without additional enable wiring.
Photo-imageable dielectric material on glass cores enables direct metal interconnect routing for integrated circuit packages.
Heat protective layer with higher thermal resistance than encapsulant blocks heat transfer from substrate to printed circuit board, preventing overheating.
Stacked silicided semiconductor fins enable high density memory capacity while managing fabrication precision through nested three dimensional structures.
Calibrating a piezoelectric wire clamp uses electrical continuity detection to adjust drive voltage, resolving opening amount variability.
Laser scribing eliminates drilling and metallizing steps to enhance production yield while reducing costs for monolithic photovoltaic modules.
A mountable integrated circuit package uses mounting interconnects to provide mechanical support and reliable connectivity within a compact encapsulation.
A semiconductor device structure uses vertical contact penetration to maintain precise alignment between gate electrodes and active regions.
Tungsten dummy contacts absorb heat during electrostatic discharge events to protect semiconductor devices from excessive temperature damage.
Embedding magnetic dielectric cores in the package substrate reduces inductor footprint while maintaining robustness and cost-effectiveness.
Segmenting RF circuits onto compound semiconductor dies reduces thermal dissipation while maintaining power amplifier efficiency in 5G applications.
A finger metal-oxide-metal capacitor uses super-vias to couple interdigitated fingers across four interconnect levels.
A sacrificial layer protects low-k dielectric materials during semiconductor etching processes to prevent structural damage.
A semiconductor interconnect structure forms a conductive pillar over a contact pad while preserving the underlying seed layer integrity.
Embedding chips in core layer recesses reduces circuit board area while two-stage curable compounds prevent moisture ingress.
Combining an LGA SiP package with a leadframe-based SMT package on a PCB increases storage capacity while maintaining standard slot thickness.
A multi-die building block uses a flex tape with electrical traces on both surfaces to couple semiconductor dies via interconnects.
Silicon-rich dielectric layers block hydrogen and water diffusion in LDMOS channels, stabilizing threshold voltage against processing contaminants.
Self-supporting films encapsulate air gaps between adjacent conductors to reduce parasitic capacitance and signal crosstalk in dense integrated circuits.
Polysiloxane via filling absorbs lateral stress from silicon interposer expansion, preventing copper pillar cracking.
A magnetic arrangement exerts force to position ferromagnetic electronic components on substrates.
Photo-thermal adhesive composition cures display panel and window bonds using combined light and heat energy.
A sacrificial layer shields the dielectric during conductive material polishing to maintain surface integrity.
Driving word lines from both sides reduces resistive-capacitive loading and read latency in 3D NAND flash without increasing circuit complexity.
Nickel-palladium-gold coating on copper bump sidewalls prevents galvanic corrosion between dissimilar metals, eliminating missing bumps and reducing yield loss.
Opening portions in first wirings reduce stress on interlayer insulation films under pads, preventing cracks during redistribution wiring formation.
Replacing glass epoxy with ceramic eliminates heat-induced warpage, while merging two redistribution layers into one reduces device height.
Punch cuts between adjacent metal traces eliminate debris generation during die-cutting, preventing short circuits in narrow frame displays.
Segmented power switch layouts surrounding core regions reduce chip area while maintaining electromagnetic compatibility resistance.
A switchgear cabinet uses a two-phase thermosiphon cooling system to dissipate heat from internal equipment.
Flip-chip bonding joins smaller dies onto larger wafers while molding material encapsulates the structure and conductive vias route signals.
A semiconductor edge termination structure uses a diffluent insulation layer to form a continuous inclined surface.
Stacked word lines and vertical pillars with alternating bit lines increase integration density while reducing manufacturing complexity.
A power module maintains compressive stress in silicone gel filling to suppress bubble formation and detachment between the gel and insulating substrate.
Replacing lead frames with a circuit board and using CCD image registration solves installation inaccuracies in miniaturized SMD diode packages.
Self-aligned double patterning creates dense memory array interconnects by reducing lithographic mask requirements.
High doping bottom layer blocks electromagnetic interference while feed-through capacitors enable necessary connections through the shield barrier.
Inclined element isolating trenches disperse stress concentration at outermost circumferences, preventing crack generation in high-density structures.