Unlock instant, AI-driven research and patent intelligence for your innovation.

Semiconductor element

A semiconductor and component technology, applied in the field of insulated gate semiconductor components, can solve problems such as inability to obtain heat dissipation, and achieve the effect of preventing thermal runaway and suppressing heat generation

Active Publication Date: 2009-02-18
SANKEN ELECTRIC CO LTD
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, the central part of the semiconductor element is affected by the heat generated by the peripheral part of the semiconductor element, and good heat dissipation cannot be obtained.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Semiconductor element
  • Semiconductor element
  • Semiconductor element

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach

[0056] Figure 1 ~ Figure 4 The semiconductor element 10 according to the first embodiment of the present invention is shown. figure 1 It is a plan view showing the semiconductor element 10 . figure 2 yes means figure 1 A plan view of a region 10 a surrounded by a dot-dash line in the illustrated semiconductor component 10 is shown. image 3 yes means figure 1 A plan view of a region 10b surrounded by a dot-dash line in the illustrated semiconductor component 10 is shown. Figure 4 yes figure 2XX cross-sectional view of the semiconductor element 10 shown. For the sake of illustration N + type launch area 14 configuration, the figure 1 In , the emitter electrode 31, the gate electrode 33, and the interlayer insulating film 35 described later are omitted, and the same as figure 2 and image 3 different, the illustrated N + The shape of the type emission area 14 is a rectangle. exist figure 2 and image 3 In , the emitter electrode 31 described later is omitted. ...

no. 2 approach

[0088] Hereinafter, a semiconductor element according to a second embodiment of the present invention will be described with reference to the drawings. The semiconductor element of this embodiment differs from the semiconductor element of the first embodiment in that although the area of ​​the emitter region is approximately the same at the peripheral portion and the central portion, the thickness of the gate insulating film is different between the peripheral portion and the central portion of the element. of. The same reference numerals are assigned to the same parts as those of the semiconductor element of the first embodiment, and detailed description thereof will be omitted.

[0089] Figure 7 ~ Figure 1 0 represents the semiconductor element 60 according to this embodiment. Figure 7 It is a plan view showing a structural example of the semiconductor element 60 . Figure 8 yes Figure 7 X1-X1 line sectional view of the shown semiconductor element 60, Figure 9 It is...

no. 3 approach

[0103] Hereinafter, a semiconductor element 80 according to a third embodiment of the present invention will be described with reference to the drawings. The semiconductor element 80 of this embodiment differs from the semiconductor elements of the first and second embodiments in that although the area of ​​the emitter region and the thickness of the gate insulating film are the same at the center and peripheral portions of the semiconductor element, the gate The impurity concentration under the insulating film is different between the central portion and the peripheral portion of the semiconductor element. The same reference numerals are assigned to the same parts as those of the semiconductor elements of the first embodiment and the second embodiment, and detailed description thereof will be omitted.

[0104] Figures 11 to 13 A semiconductor element 80 according to this embodiment is shown. Figure 11 It is a plan view showing a configuration example of the semiconductor ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A semiconductor element (10) is provided with a P type base region (13) formed in an N- type base region (11); and a plurality of N+ type emitter regions (14) formed by being separated from each other in the P type base region (13). The N+ type emitter region (14) is formed to have a ratio of an area occupied by the N+ type emitter region (14) at a center part of the semiconductor element (10) in the P type base region (13) to be smaller than a ratio of an area occupied by the N+ type emitter region (14) at a circumference part of the semiconductor element (10) in the P type base region (13).

Description

technical field [0001] The present invention relates to an insulated gate semiconductor element having an insulated gate structure. Background technique [0002] Conventional insulated gate bipolar transistors (Insulated Gate Bipolar Transistor: hereinafter referred to as IGBTs) have the high input impedance of field effect transistors and the high current driving capability of bipolar transistors, and are especially suitable for power switching elements. [0003] In such a semiconductor element, in order to prevent destruction of the semiconductor element due to thermal runaway, etc., it is necessary to improve heat dissipation. For this purpose, the semiconductor element is fixed to a support sheet (heat sink) which also serves as a heat sink by means of solder or the like. The heat generated by the semiconductor element is discharged to the outside from the heat sink via the surface of the semiconductor element and the solder. [0004] However, especially for power semi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/739H01L27/04H01L29/78H01L21/28
CPCH01L2924/0002H01L2924/00
Inventor 鸟居克行
Owner SANKEN ELECTRIC CO LTD