Multilayer structure forming method, method of manufacturing wiring board, and method for manufacturing electronic apparatus
A manufacturing method and technology of electronic instruments, applied in the direction of cable/conductor manufacturing, semiconductor/solid device manufacturing, and improvement of metal adhesion of insulating substrates, etc., can solve the problem of small area of extended wetting
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Embodiment approach 1
[0059] (A. The overall structure of the droplet ejection device)
[0060]The method for forming a multilayer structure according to this embodiment uses the droplet ejection devices 1 to 6 shown in FIG. 1 . The droplet discharge devices 1 to 6 are devices for discharging the insulating material 7A ( FIG. 1 ), the conductive material 8A, the insulating material 9A, the insulating material 11A, the conductive material 15A, and the insulating material 17A. Furthermore, as described below, the insulating material 7A, the conductive material 8A, the insulating material 9A, the insulating material 11A, the conductive material 15A, and the insulating material 17A are all types of liquid materials.
[0061] The droplet discharge device 1 shown in FIG. 1 is basically an inkjet device. More specifically, the droplet ejection device 1 is equipped with: a container 101 for holding a liquid material 111, a pipe 110, a base GS, a nozzle head 103, a table 106, a first position control devic...
Embodiment approach 2
[0132] The method of forming the multilayer structure of the present embodiment is the same as the method of forming the multilayer structure of the first embodiment except for the method of forming the insulating pattern 11 . For this reason, descriptions of the same steps and configurations as those in Embodiment 1 are omitted to avoid duplication.
[0133] First, as described in Embodiment 1, the insulating patterns 9 ( Image 6 (a) to (c)). Then, light is irradiated to the base region 20 to make the surface of the insulating layer 7 lyophilic ( Image 6 (d)). The ejection step for forming the insulating pattern is carried out as follows, as is generally performed on a flat surface.
[0134] As shown in FIG. 9( a ), an insulating pattern 51 is provided in a part of the insulating layer 7 where the wiring pattern 25 is not present by the ejection step and the curing step. Since the thickness of the insulating pattern 51 is set to be the same as the thickness of the wirin...
Embodiment approach 3
[0142] Hereinafter, a method of manufacturing a wiring board using the method for forming a multilayer structure of the present embodiment will be described.
[0143] First, prepare a setup such as Figure 10 The substrate 10A of the wiring pattern 25P shown in (a) and (b). Here, the wiring pattern 25P has a structure in which gold (Au) is plated on the surface of the copper wiring. Of course, the entire wiring pattern 25P may be formed of gold (Au). In the present embodiment, such a wiring pattern 25P is located on the surface of the substrate 10A. In this way, the surface of the substrate 10A is an example of the "object surface" of the present invention. Hereinafter, the substrate 10A and one or more layers on the substrate 10A are collectively referred to as "base body 10B".
[0144] like Figure 10 As shown in (b), the wiring pattern 25P includes the wiring 25PA, the wiring 25PB, and the wiring 25PC. The wiring 25PA, the wirings 25PB, and 25PC all have a strip shape...
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Abstract
Description
Claims
Application Information
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