Photoresist coating device and its method
A technology of photoresist and spraying device, which can be applied to devices for coating liquids on surfaces, coatings, photo-engraving process coating equipment, etc., and can solve problems such as inconvenience, no adjustment, and unfavorable production efficiency.
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[0070] The specific implementation manners of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0071] The photoresist spraying device of the present invention plays a key role in spraying the photoresist on the wafer surface in order to form a uniform photoresist film on the wafer surface during the photolithography process. The invention utilizes the dummy nozzle to calibrate the concentricity of the nozzle and the wafer and the height of the nozzle from the wafer surface. In a preferred embodiment, the scale axis in the dummy nozzle is extended by 5±0.1 mm from the lower end surface of the housing, that is, the height of the nozzle from the wafer surface is adjusted to 5±0.1 mm. The implementation process and essential content of the present invention are described with preferred embodiments.
[0072] figure 2 It is a structural schematic diagram of the photoresist spraying device of the present invention. Such as ...
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