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Lithographic apparatus and device manufacturing method

A technology of lithography and components, applied in semiconductor/solid-state device manufacturing, photolithography exposure equipment, microlithography exposure equipment, etc.

Active Publication Date: 2012-03-21
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] One of the problems with immersion lithography is thermal conditioning of the substrate

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] figure 1 A photolithographic apparatus according to an embodiment of the present invention is schematically shown. The unit includes:

[0031] - an illumination system (illuminator) IL configured to condition a radiation beam B (eg UV radiation or DUV radiation);

[0032] - a support structure (eg mask table) MT configured to support a patterning member (eg mask) MA and connected to a first positioner PM configured to precisely position the patterning member according to certain parameters;

[0033] - a substrate table (e.g. a wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and connected to a second positioner PW configured to precisely position the substrate according to certain parameters base;

[0034] - A projection system (eg a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning means MA onto a target portion C of the substrate W (eg comprising one or more dies)...

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PUM

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Abstract

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate, the substrate table comprising a conditioning system configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper in fluidcommunication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.

Description

technical field [0001] The invention relates to a photolithography device and a device manufacturing method. Background technique [0002] A lithographic apparatus is a device that applies a desired pattern to a substrate, usually to a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, which may also be referred to as a mask or reticle, may be used to create a circuit pattern formed on a single layer of the IC. The pattern may be transferred onto a target portion (eg comprising a portion, one or more dies) of a substrate (eg a silicon wafer). This transfer of the pattern is usually performed by imaging onto a layer of radiation sensitive material (resist) on the substrate. In general, a single substrate contains a grid of adjacent target portions that are patterned sequentially. Known lithographic apparatuses include so-called steppers and scanners, in whi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G03F7/20
CPCG03F7/70341F16L55/053G03F7/70875G03F7/70783
Inventor M·维克曼斯M·A·W·崔帕斯F·E·德琼格E·A·M·范冈佩尔R·詹森G·A·A·M·库斯特斯T·P·M·卡迪M·F·P·斯米茨F·范德穆伦W·F·J·西蒙斯M·H·A·利恩德斯J·J·奥坦斯M·范巴伦
Owner ASML NETHERLANDS BV