Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Filtering device and filtering system used for pinching and processing toxic harmful dust

A filter device and filter system technology, applied in the direction of dispersed particle filtration, cleaning method using gas flow, cleaning method and utensils, can solve the problems of pollution, no purification of toxic and harmful substances, and reduce the cleanliness of FAB, so as to avoid flying Diffusion, concentrated processing convenient effect

Inactive Publication Date: 2010-06-23
SEMICON MFG INT (SHANGHAI) CORP +1
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the vacuum system itself does not have the ability to purify toxic and harmful substances, and the vacuum system circulates within the entire FAB range, using this method to deal with toxic dust will pollute the FAB's circulation system, thereby reducing the cleanliness of the FAB

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Filtering device and filtering system used for pinching and processing toxic harmful dust
  • Filtering device and filtering system used for pinching and processing toxic harmful dust
  • Filtering device and filtering system used for pinching and processing toxic harmful dust

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] The filter device and filter system for collecting and processing toxic and harmful dust of the present invention will be further described in detail with reference to the accompanying drawings.

[0017] figure 1 and figure 2 They are the longitudinal section view of the disassembled state of the first embodiment of the present invention and the left view of the filter screen support respectively. The filter device of the present invention mainly includes three parts: a main body 1 , a filter screen support 3 and a filter head 5 . The front and rear ends of the main body 1 are opened respectively to form a hollow shell, which has a chamber 4 for accommodating the filter screen support 3 . Several perforations 4 are arranged on the side wall and the bottom surface of the filter screen support 3 to facilitate air circulation, and the number and size of the perforations 4 can be changed according to the requirements of the filter device. The filter head 5 is directly c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to a filtering device and a filtering system which is connected outward with a vacuum system and is used for collecting and disposing the poisonous and nocuous dust produced in the production process of semiconductor. The prior poisonous dust collecting and disposing method can easily pollute the factory environment and also does harm to the human body. The present invention comprises a main body, a filtering net bracket and a filtering head, wherein, the main body is provided with a cavity, which is used for containing the filtering net bracket; both ends of themain body are respectively provided with an opening, and the front end of the main body is connected with the filtering head; the bottom surface of the filtering net bracket is provided with a through hole, which ensures the inner of the filtering device to form an air flow channel. The present invention can fast and conveniently collect the poisonous dust into a particular filtering net, which not only avoids the flying of the dust, but also prevents the vacuum system from being polluted.

Description

technical field [0001] The present invention relates to the environmental maintenance of wafer foundry, and relates to the collection and treatment of toxic and harmful dust. Specifically, it is a filter connected to a vacuum system for collecting and processing toxic and harmful dust generated in the semiconductor manufacturing process. devices and filtration systems. Background technique [0002] Wafer foundries need to use various chemicals and materials in the semiconductor manufacturing process, and will generate a lot of waste and residual substances, including some toxic dust particles, such as arsenic. These toxic and harmful dust must be collected by the staff first, and can only be discharged to the outside after special treatment. Once disposed of improperly, it will not only affect the environment, but also pose a serious threat to human health. [0003] Usually, the staff use a rag to collect these toxic and harmful dusts together, put them into garbage bags an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B01D46/00B08B5/04
CPCY02A50/2351
Inventor 吴根兴李雨庭黄志良龚伟平关业群张龙
Owner SEMICON MFG INT (SHANGHAI) CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products