Substrate support assembly

Abstract

A substrate support assembly comprises a support block having an electrode and an arm to hold the support block in the process chamber, the arm having a channel therethrough. The arm has a first clamp to attach to the support block and a second clamp to attach to a chamber component. A cover lock comprises an annular disc that is seated in the arm beneath the first clamp to cover and seal off electrical conductors in the channel from the chamber environment.

Description

technical field [0001] Embodiments of the invention relate to a substrate support assembly for supporting a substrate in a processing chamber. Background technique [0002] In the fabrication of electronic circuits such as, for example, integrated circuits and displays, a substrate is placed in a process chamber and a process gas is introduced into the chamber to process the substrate. A processing chamber generally includes an enclosure wall surrounding a substrate processing area. Gas energizers can be used to excite process gases by applying RF or microwave energy to the gas. The process gas is excited to etch features in layers on the substrate or to deposit layers on the substrate. [0003] In the processing chamber, the substrate is held on the substrate receiving surface of the substrate holder. The substrate holder may have electrodes that can be charged to electrostatically hold the substrate. The electrode can also be charged or held at ground potential by an e...

AI Technical Summary

Problems solved by technology

The RF potential applied to the electrodes used to excite the gas in the chamber can also cause glow discharges or micro-arcing that damage or "burn" the connectors and adjacent parts of the stent

In some plasma environments, after processing only a relatively small number of substrates, the degradation of the substrate support assembly and its conductor assembly may require their retooling or replacement, which increases the preparation cost per substrate

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