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Auxiliary guidance system and device for vacuum sputtering device

A vacuum sputtering and guiding device technology, which is applied in vacuum evaporation coating, sputtering coating, ion implantation coating, etc.

Inactive Publication Date: 2012-02-01
灿元科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, if the design of the guide device can be added to the vacuum sputtering device to assist the opening and closing of the door panel, the above-mentioned troubles caused by the operator's operation due to the heavy door panel can be solved. Disadvantages, specially developed an auxiliary guidance system for guiding the door opening or closing procedure of a vacuum sputtering device

Method used

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  • Auxiliary guidance system and device for vacuum sputtering device
  • Auxiliary guidance system and device for vacuum sputtering device
  • Auxiliary guidance system and device for vacuum sputtering device

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Embodiment Construction

[0030] In order to enable those skilled in the art to understand the purpose, features and effects of the present invention, the present invention will be described in detail by the following specific embodiments and accompanying drawings, as follows.

[0031] The auxiliary guiding system of the present invention is used to guide the opening or closing of the door panel of a vacuum sputtering device; please refer to figure 1 and figure 2 Illustrate the closing and opening state schematic diagram of the present invention, wherein, the auxiliary guiding device 1 of the present invention comprises: two air cylinders 11, are respectively arranged on the both sides of this vacuum sputtering device 2, to provide the required auxiliary for opening or closing the door panel Power; the second flow control assembly 12 is arranged on the air inlet and outlet of the pneumatic cylinder 11 to adjust the gas flow, and then control the auxiliary force of the pneumatic cylinder 11 to guide th...

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Abstract

The present invention relates to an auxiliary guiding system for a vacuum sputtering device, which includes at least one pneumatic cylinder arranged on one side of the vacuum sputtering device to provide auxiliary and buffer power; The control component regulates the flow of high-pressure gas in and out of the pneumatic cylinder to control the speed of the door panel; an auxiliary nitrogen cylinder arranged outside the pneumatic cylinder; and a direction control component connected with the flow control component by a pneumatic pipeline to regulate The air pressure working circuit reaches a predetermined state; the door panel of the vacuum sputtering device is assisted by the auxiliary guiding system of the present invention to open or close.

Description

technical field [0001] The present invention relates to an auxiliary guiding system, in particular to an auxiliary guiding system for a vacuum sputtering device. Background technique [0002] In the semiconductor manufacturing process, vacuum sputtering technology is an important part of it. The sputtering device used is often due to the thickness of the door panel, so that the operator often needs to spend a lot of effort to open or close it, and sometimes even requires two people to close it. It is quite inconvenient to operate. What's more, the operator often hurts his fingers when closing the door because he cannot bear the weight of the door. [0003] According to the patent of "Positioning and Guiding Mechanism" of Taiwan No. 573599, which was announced on January 21, 2004, it discloses a positioning and guiding mechanism for receiving objects to be processed from a mechanical arm, including a plurality of A movement mechanism, the plurality of movement mechanisms are...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35
Inventor 郭勋聪
Owner 灿元科技股份有限公司