Planar array exposure device and exposure method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- HANS LASER TECH IND GRP CO LTD
- Publication Date
- 2010-08-25
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to an area array exposure device, and also relates to an exposure method of the area array exposure device. Background technique
[0002] As shown in Figure 1, the exposure method of the existing area array exposure device is as follows: the image splitter divides the image data 21 to be exposed into small block-shaped partial images such as 30 according to the maximum area and resolution of the exposure of the exposure head. , 31, the length d of the partial images in the X direction shown in the figure is basically the same, and the image data to be exposed are stored in the memory in the form of small block partial image data.
[0003] At a predetermined exposure position, the light modulator in the exposure head takes out partial image data such as 30 from the memory, and spatially modulates the light beam emitted from the light source. ), the light beam reflected by the DMD is irradiated to the imaging surface through the le...