Planar array exposure device and exposure method thereof

A technology of exposure device and exposure method, which is applied in the direction of developing and printing devices, optics, instruments, etc., can solve the problems of affecting the exposure efficiency, affecting the exposure speed, and taking a long time, so as to improve the exposure efficiency, increase the exposure speed, and reduce the positioning time Effect
CN101419390BInactive Publication Date: 2010-08-25HANS LASER TECH IND GRP CO LTD +1

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
HANS LASER TECH IND GRP CO LTD
Publication Date
2010-08-25
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses an area array exposure device and an exposure method. The method comprises the following steps: a moving step in which an optical head of the area array exposure device moves to a position near an adjacent N+1st preset exposure position after exposing an Nth image block at an Nth exposure position, wherein N is a positive integer; a detection and adjustment step in which aposition at which the optical head stops is detected to judge whether complete pixel splicing can be realized among adjacent image blocks, if yes, an exposure step is carried out, if no, the positionof the optical head is adjusted finely to realize the complete pixel splicing of the adjacent image blocks and then turn to the exposure step; an exposure step in which the N+1st image block is exposed at the N+1st actual exposure position, and a starting point of the N+1st image block is connected with an end point of the Nth image block; and the steps are repeated until the image to be exposed is completely exposed. In the method, the position adjustment range of the optical head is controlled within the width of the pixels, thus largely reducing the positioning time and improving the exposure efficiency.
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Description

technical field

[0001] The invention relates to an area array exposure device, and also relates to an exposure method of the area array exposure device. Background technique

[0002] As shown in Figure 1, the exposure method of the existing area array exposure device is as follows: the image splitter divides the image data 21 to be exposed into small block-shaped partial images such as 30 according to the maximum area and resolution of the exposure of the exposure head. , 31, the length d of the partial images in the X direction shown in the figure is basically the same, and the image data to be exposed are stored in the memory in the form of small block partial image data.

[0003] At a predetermined exposure position, the light modulator in the exposure head takes out partial image data such as 30 from the memory, and spatially modulates the light beam emitted from the light source. ), the light beam reflected by the DMD is irradiated to the imaging surface through the le...

Claims

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