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Device for treating substrates and support frame thereof

A technology of a substrate processing device and a support frame, which is applied in the field of support frames, and can solve problems such as blocking the passage of operators and reducing operability

Active Publication Date: 2013-03-06
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art, the frame for scaffolding adjacent to the support frame obstructs the passage of the operator, and there is also a problem of reduced operability.

Method used

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  • Device for treating substrates and support frame thereof
  • Device for treating substrates and support frame thereof
  • Device for treating substrates and support frame thereof

Examples

Experimental program
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no. 2 approach

[0094] Next, a second embodiment of the present invention will be described with reference to the drawings. Figure 7 It is a plan view schematically showing a configuration example of the substrate processing apparatus according to the second embodiment. like Figure 7 As shown, this substrate processing apparatus 200 is similar to the substrate processing apparatus 100 of the first embodiment, and a plurality of processing chambers 110 and load lock chambers 130 are provided around the transfer chamber 120 .

[0095] Figure 7 Each of the processing chambers 110 (110A-110C) shown is composed of a base part 112 (112A-112C) and a cover part 114 (114A-114C) which is freely detachable from the base part 112 (refer to figure 1 ). In addition, a pair of guide rails 202 ( 202A to 202C) extending to the side surfaces of these processing chambers 110 ( 110A to 110C) are respectively provided. These pair of guide rails 202 (202A~202C) are used to make the cover body part 114 that ...

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PUM

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Abstract

The present invention provides a device for treating substrates and a support frame thereof. By means of the support frame, it is capable of using a space below a timber support used for maintenance operations and the like of the device for treating the substrate efficiently. On the support frame (140) located on ground for supporting the device (100) which is provided with a plurality of treating chambers (110), a portion away from the ground by a presetting height is provided with the timber support (160) directly in a mode of projecting toward an external side from the circumference of the treating chambers. The timber support is provided with a plurality of support brackets (162) mounted on the external side of the support frame, and a timber support plate (164) supported by the support brackets horizontally.

Description

technical field [0001] The present invention relates to a substrate processing apparatus including a processing chamber for performing predetermined processing on a substrate to be processed, and a support frame for supporting the substrate processing apparatus. Background technique [0002] In the semiconductor manufacturing process, predetermined processes such as etching and film formation are used on substrates to be processed such as glass substrates (such as flat panel display substrates such as liquid crystal displays) or semiconductor wafers (hereinafter also simply referred to as "wafers") processing substrate processing equipment. In recent years, multi-chamber substrate processing apparatuses including a plurality of processing chambers (chambers) have been widely used for the purpose of high integration and high process quantization. In such a substrate processing apparatus, a plurality of processing chambers and transfer chambers are connected by gate valves, a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/687H01L21/00
CPCF24F3/167H01L21/67126H01L21/67161H01L21/67167H01L21/6719H01L21/67242
Inventor 山田俊一下健一中込阳一
Owner TOKYO ELECTRON LTD