Unlock instant, AI-driven research and patent intelligence for your innovation.

Incremental analysis of layout design data

A technology for layout design and analysis standards, applied in the field of incremental layout analysis, which can solve complex problems

Active Publication Date: 2010-03-10
SIEMENS IND SOFTWARE NV
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Furthermore, using conventional design rule checking techniques, the designer needs to run the design rule checking process 10 to 15 times until the design is satisfactory
Further, designers expect that the standards for designing microcircuits and analyzing these designs will continue to become more complex in the future

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Incremental analysis of layout design data
  • Incremental analysis of layout design data
  • Incremental analysis of layout design data

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] Organization of layout design data

[0018] As used herein, the term "design" is meant to include data describing an entire micro device, such as an integrated circuit device or a microelectromechanical system (MEMS) device. However, the term is also intended to include smaller sets of data describing one or more components of an overall microcircuit, such as a layer of an integrated circuit device, or even a portion of a layer of an integrated circuit device. Further, the term "design" is also meant to include data describing multiple microdevices, such as data that will be used to create a mask or reticle to simultaneously form multiple microdevices on a single substrate. The layout design data may be in any desired format, such as the Graphical Data System II (GDSII) data format or the Open Artwork System Interchange Standard (OASIS) data format proposed by Semiconductor Equipment and Materials International (SEMI). Other formats include the Open Access open source ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Techniques for incrementally analyzing layout design data are disclose. With various implementations, a subsequent incremental analysis can be made for only portions of layout design data, using a subset of available analysis criteria, or some combination of both. For example, the analysis can be limited to errors identified in a previous analysis process, to changes in the layout design data madeafter a previous analysis process, to particular areas specified by a designer, or some combination thereof. Still further, the analysis process may be performed using only a subset of analysis criteria relevant to the portions of the design data being analyzed, a subset of the initial analysis criteria that the design data failed in a previous analysis process, a subset of the initial analysis criteria selected by the designer, or some combination thereof. Further, such an incremental analysis process can be initiated before a previous analysis process has completed.

Description

[0001] Related Applications and Cross-References [0002] This application claims priority under 35 U.S.C. §119 of the Patent Act to U.S. Provisional Patent Application No. 60 / 894,151, filed March 9, 2007, entitled "Incremental Design Rule Checking," by James Paris et al. This provisional patent application is hereby incorporated by reference in its entirety. technical field [0003] The invention is used for incremental analysis of layout design data. Aspects of the invention are particularly beneficial for analyzing modifications in layout design data based on the results of a previous analysis, such as the results of a design rule checking analysis or a design manufacturability analysis. Background technique [0004] Electronic circuits, such as integrated microcircuits, are used in everything from automobiles to microwaves to personal computers. A typical process from design to fabrication of a microcircuit device includes many steps in what is known as a "design flo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
CPCG06F17/5081G06F30/398G06F16/00
Inventor J·M·帕里斯B·玛歇尔J·G·菲尔格森
Owner SIEMENS IND SOFTWARE NV