Ion source with gas buffer balancing function

Abstract

The invention relates to an ion source with a gas buffer balancing function, which comprises a gas source, an electric arc chamber and a guide pipe, wherein the guide pipe is used for connecting the gas source and the electric arc chamber; the electric arc chamber comprises an electric arc cavity provided with a lamp filament; the gas inlet position of the electric arc chamber is provided with a gas containing cavity; a gas inlet of the gas containing cavity is communicated with the guide pipe, and a gas outlet of the gas containing cavity is communicated with the electric arc chamber. By adopting the ion source with the structure, the gas can continuously, uniformly and stably flow into the gas containing cavity of the electric arc chamber, and the continuous and stable ionizing effect can be achieved.

Description

technical field [0001] The invention improves the ion source so that the ion source has the function of gas buffer uniformity, and the ion source is mainly used in an ion implanter. Background technique [0002] At present, most of the ion sources of various manufacturers are designed for the mode of gas introduction using high and low pressure gas cylinders, using pressure or vacuum suction to set the gas through the flowmeter and using a catheter to introduce the arc chamber of the ion source, so as to realize the heat transfer under the action of a magnetic field. Electrons strike gas molecules and ionize to create an ion beam. However, the current ion source gas flow introduction device generally has a flow rate that is prone to fluctuations, resulting in unstable ion beams, especially in the following situations: 1. When the gas cylinder is exhausted or replaced; 2. Maintenance machine A period of time after the gas source is turned on again; 3. The flowmeter works uns...

AI Technical Summary

Problems solved by technology

However, the current ion source gas flow introduction device generally has a flow rate that is prone to fluctuations, resulting in unstable ion beams, especially in the following situations: 1. When the gas cylinder is exhausted or replaced; 2. Maintenance machine A period of time after restarting the gas source behind the stage; 3. The flowmeter is not working stably, resulting in fluctuations in gas flow

At the same time, at the present stage, all manufacturers have designed the arc chamber as a square shape and the gas inlet hole of the arc chamber is single. All of the above lead to poor gas balance when the existing ion source is working, just like cooking with a high fire. As a result, the gas cannot be fully ionized, and the burrs on the arc chamber cover near the inlet hole are serious, which will affect the stability of the ion beam

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