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Developer solution component

A technology of composition and developer, applied in the direction of photosensitive material processing, etc., can solve the problems of white turbidity of developer, blocked pipeline, side effects, etc.

Inactive Publication Date: 2012-01-11
ETHICAL INT WAREHOUSING TRADING SHANGHAI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] However, since this type of alkaline developer is added with a non-ionic surfactant, it will inherit the cloud point representing one of the properties of the surfactant (when the temperature of the alkaline developer is increased or the concentration is increased, the developer will change. cloudy temperature)
In particular, the inorganic alkali developer occasionally has the following problems: the alkaline developer may become cloudy and stratified when heated during storage or transportation, and then precipitate, and what is serious is that the metering error may occur due to stratification in the storage tank. The concentration is incorrect, and the concentration and composition ratio of the upper and lower layers are different. What's more serious is that in the transportation pipeline, due to the temperature change, it will separate out and accumulate in the dead corner of the pipeline, thereby blocking the pipeline.
[0011] Another way to increase the cloud point of the alkaline developer is to add an additive to increase the cloud point, such as the addition of a monocarboxylic acid compound with a special structure mentioned in the TW200836026 published patent, such as adding sodium benzoate, which can effectively Raises the cloud point, but still has other side effects, such as possible death of microorganisms in the wastewater pond

Method used

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Embodiment Construction

[0025] The invention is described in further detail using the following specific examples:

[0026] The following examples have a more specific description of the method for the implementation of the present invention, but the scope of rights claimed by the present invention is not limited to the following examples. Herein, the part where the concentration is not particularly marked is based on weight.

[0027] Hereinafter, one group of examples and five groups of comparative examples are listed, as shown in Table 1.

[0028] "Preparation of high-concentration developer composition"

[0029] According to the weight ratio in Table 1, (a1) Basic Compound 1, (a2) Basic Compound 2, (b1) Surfactant 1, (b2) Surfactant 2, and then add ultrapure water to mix to prepare Aqueous solution weighing 100 g.

[0030] "Determination of cloud point"

[0031] Put the "developer composition" prepared according to Table 1 in a beaker, then slowly heat it, and measure its temperature with a th...

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Abstract

The invention relates to a developer solution component which comprises: (a) 0.01-30 parts by weight of alkaline compound; (b) 0.01-30 parts by weight of anionic surface active agent shown by the following formula (I); and (c) 100 parts by weight of developer solution component prepared by rest parts by weight of water, wherein X, R1, R2, n and m are defined in a specification. By utilizing the anionic surface active agent, the developer solution component has high cloud point, thus increasing the concentration of the developer solution component.

Description

technical field [0001] The present invention relates to a developer solution composition, especially a photoresist developer solution composition, which can be formulated as a high-concentration developer solution composition, and is especially suitable for developing photoresist agents for color filters use. Background technique [0002] Generally, in the processes of integrated circuits, printed circuit boards, and liquid crystal displays, in order to obtain fine images, radiation-sensitive compositions such as photoresists are often used to form thin films on substrates by coating. Liquid development, to remove unnecessary parts of the coating film, in order to obtain a good image. [0003] Commonly used developing methods include techniques such as immersion developing, shaking developing, spray developing and static developing. Because the general photoresist is made of alkali-soluble resin, such as: phenolic resin (Novolac), acrylic resin, poly-p-hydroxystyrene, etc....

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/32
Inventor 刘大铭李晏成郑敏精周德纲
Owner ETHICAL INT WAREHOUSING TRADING SHANGHAI