Positive lithograph plate photosensitive composition with high resolution and high sensitivity

A high-sensitivity, high-resolution technology, applied to photosensitive materials used in optomechanical equipment, photoplate-making processes on patterned surfaces, optics, etc. Guarantee, increase the complexity of the formula, etc.

Active Publication Date: 2010-07-07
LUCKY HUAGUANG GRAPHICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In fact, although these patented technologies can improve the sensitivity and/or resolution of the plate to a certain extent, the magnitude is not obvious, or the overall performance of the plate i

Method used

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  • Positive lithograph plate photosensitive composition with high resolution and high sensitivity
  • Positive lithograph plate photosensitive composition with high resolution and high sensitivity
  • Positive lithograph plate photosensitive composition with high resolution and high sensitivity

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] The photosensitive composition of the high-resolution and high-sensitivity positive-working lithographic plate is as follows:

[0036] (a) Film-forming resin: BTB-24 (Weihai Tiancheng Chemical Factory) 6.40g

[0037](b) Add resin: SP-1077 (SI Group) 0.20g

[0038] (c) Photoactive resist: PAC214 / PAC215 (The Second Film Factory of Lucky Group) 1.2 / 1.2g

[0039] (d) Source of photoacid generation: TB (the second film factory of Lucky Group) 0.15g

[0040] (e) UV absorbing dye: Dye 1 (Clariant) 0.05g

[0041] (f) background coloring dye: OB-603 (Beijing Chemical Factory) 0.3g

[0042] (g) Solubilizer: 0.5 g of citric acid.

[0043] The above-mentioned photosensitive composition was dissolved in 90 grams of ethylene glycol monoethyl ether solvent to prepare photosensitive solution 1 with a solid content of 10%.

Embodiment 2

[0045] The photosensitive composition of the high-resolution and high-sensitivity positive-working lithographic plate is as follows:

[0046] (a) film-forming resin: phenol-m-cresol-formaldehyde resin 25g

[0047] (b) Add resin: SP-1077 (SI Group) 10g

[0048] (c) Photoactive resist: PAC214 / PAC215 (The Second Film Factory of Lucky Group) 6.67 / 33.33g

[0049] (d) Source of photoacid generation: 1-phenyl-3,5 bistrichloromethyl triazine 5g

[0050] (i) UV absorbing dye: Dye II (Clariant) 5g

[0051] (f) Background coloring dye: basic brilliant blue 5g

[0052] (g) Solubilizer: maleic acid 10g.

[0053] The above photosensitive composition was dissolved in 233 grams of butanol solvent to prepare photosensitive solution 2 with a solid content of 30%.

Embodiment 3

[0055] The photosensitive composition of the high-resolution and high-sensitivity positive-working lithographic plate is as follows:

[0056] (a) film-forming resin: o-cresol-formaldehyde resin 80g

[0057] (b) Add resin: SP-1077 (SI Group) 2g

[0058] (c) Photoactive resist: PAC214 / PAC215 (The Second Film Factory of Lucky Group) 3.33 / 6.67g

[0059] (d) Source of photoacid generation: 1-methoxyphenyl-3,5 bistrichloromethyl triazine 0.1g

[0060] (j) Ultraviolet absorbing dye: Dye III (Clariant) 0.01g

[0061] (f) Background coloring dye: Victoria Pure Blue 0.5g

[0062] (g) Solubilizer: 7.39g of phthalic acid.

[0063] The above photosensitive composition was dissolved in 400 grams of methyl ethyl ketone solvent to prepare photosensitive solution 3 with a solid content of 20%.

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Abstract

The invention relates to a positive lithograph plate photosensitive composition with high resolution and high sensitivity. The photosensitive composition provided by the invention is characterized by comprising at least one of three-structure antihalation compounds, uses 215 diazonaphthoquinone sulphonate and 214 diazonaphthoquinone sulphonate jointly, and has one or more of linear phenolicresin, one photoacid generator, one or more of development accelerator, one background dye and the like. The photosensitive lithograph plate manufactured by the photosensitive composition has the characteristics of rapid photosensitive speed, high resolution, large exposure latitude, good weak base development performance, higher pressrun and the like, and the plate is suitable for UV-CTP platemaking.

Description

technical field [0001] The invention belongs to the field of photosensitive functional polymer materials, and in particular relates to a high-resolution and high-sensitivity positive-working photosensitive composition for lithographic printing plates. Background technique [0002] It has a history of more than 70 years since the invention of the diazonaphthoquinone positive PS plate by Kalle in Germany in the 1930s. This system has always been the basic system of the commercial positive PS plate, and all the commercial positive PS plates in my country use diazonaphthoquinone sulfonate compound as the photoactive compound (PAC). Another basic component of positive PS plate is novolak resin. The photoactive compound and the film-forming resin are mixed in a certain proportion, a certain amount of background coloring dye is added, and a positive PS plate photosensitive solution is prepared with a solvent such as ethylene glycol monoalkyl ether. [0003] In recent years, with ...

Claims

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Application Information

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IPC IPC(8): G03F7/016G03F7/021G03F7/004
Inventor 孔祥丽门红伟王泳王献涛
Owner LUCKY HUAGUANG GRAPHICS
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