Unbalanced magnetron sputtering C/Ta graphite-like carbon film and preparation method thereof
A magnetron sputtering and unbalanced technology, which is applied in sputtering plating, ion implantation plating, coating, etc., can solve the problems of insufficient lubrication ability and extreme pressure wear life, and achieve the improvement of base film bonding force, durability The effect of improving abrasiveness
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Embodiment 1
[0052] Determine the graphite-like carbon film composition, wherein, the transition layer 2 adopts pure Cr, and the composition of the C / Ta composite working layer 4 is designed according to the mass percentage, Ta: 10%, the balance is C, and the sum of the mass percentages of each component is 100%.
[0053] Carry out pre-treatments such as rust removal and polishing on the coated workpiece, and perform ultrasonic dewaxing, degreasing cleaning, drying, and evenly fix the cleaned workpiece on the special coating tooling.
[0054] First, the surface of the part is cleaned by sputtering, and the vacuum degree is 10 -3 Pa, bias voltage 500V, tooling rotation speed 1.0r / min. First use the static recoil technology to sputter clean the surface layer of the metal substrate; gradually increase the sputtering current of the Cr sputtering target to 5.0A to prepare a 0.3μm Cr metal transition layer; then gradually increase the sputtering current of the C target to 6.0A, At the same tim...
Embodiment 2
[0056] Determine the composition of the graphite-like carbon film, wherein the transition layer 2 adopts pure Cr, and the composition of the C / Ta composite working layer 4 is designed according to the mass percentage, Ta: 30%, the balance is C, and the sum of the mass percentages of each component is 100%.
[0057] Carry out pre-treatments such as rust removal and polishing on the coated workpiece, and perform ultrasonic dewaxing, degreasing cleaning, drying, and evenly fix the cleaned workpiece on the special coating tooling.
[0058] First, the surface of the part is cleaned by sputtering, and the vacuum degree is 10 -3 Pa, bias voltage 600V, tooling rotation speed 3r / min. First use the static recoil technology to sputter clean the surface layer of the metal substrate; gradually increase the sputtering current of the Cr sputtering target to 6.0A to prepare a 0.4μm Cr metal transition layer; then gradually increase the sputtering current of the C target to 7.0A, Reduce the ...
Embodiment 3
[0060] Determine the composition of the C / Ta graphite carbon film, the transition layer 2 uses pure Cr, and the composition of the C / Ta composite working layer 4 is designed according to the mass percentage: Ta: 50%, the balance is C, the sum of the mass percentages of each component is 100%.
[0061] Carry out pre-treatments such as rust removal and polishing on the coated workpiece, and perform ultrasonic dewaxing, degreasing cleaning, drying, and evenly fix the cleaned workpiece on the special coating tooling.
[0062] First, the surface of the part is cleaned by sputtering, and the vacuum degree is 10 -4 Pa, bias voltage 700V, tooling rotation speed 5r / min. First use the static recoil technology to sputter clean the surface layer of the metal substrate; gradually increase the sputtering current of the tantalum target to 7.0A to prepare a 0.5μm Ta metal transition layer; then gradually increase the sputtering current of the C target to 8.0A and reduce it by one The sputte...
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