Storage device and operating method thereof
A memory, operation storage technology, applied in static memory, read-only memory, digital memory information and other directions, can solve problems such as reducing memory operation margin
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[0055] figure 1 It is a schematic cross-sectional view of a memory cell according to an embodiment of the present invention. Such as figure 1 As shown, memory cell 100 has substrate 102 . Two source / drain regions 104 are formed in the substrate 102 . The bottom insulating layer 108 of the memory cell 100 is formed on the channel between the source / drain regions 104 . Charge trapping layer 110 is located on top of insulating layer 108 , which is electrically isolated from substrate 102 by insulating layer 108 . When hot electrons are injected into the charge trapping layer 110, the hot electrons are trapped so that the threshold voltage of the memory cell 100 will be adjusted under control. The top insulating layer 112 is formed on the charge trapping layer 110 to electrically isolate the conductor gate 114 from the charge trapping layer 110 . The memory unit 100 has a first data storage region 110 a close to one of the source / drain regions 104 and a second data storage re...
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