Low-reflection plating glass and preparation method thereof
A coating glass and reflectivity technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, can solve the problems of low reflection and slow sputtering speed of coated glass, and achieve fast sputtering speed and high preparation simple craftsmanship
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[0039] In addition, the preparation method of the coated glass of the present invention comprises the steps of:
[0040] Step 1: providing a glass substrate;
[0041] Step 2: Depositing a first oxide layer on the glass substrate;
[0042] Step 3: Depositing a second oxide layer on the first oxide layer;
[0043] Step 4: a third oxide layer on the second oxide layer;
[0044] Step 5: Outermost oxide layer on the third oxide layer.
[0045] Among them, the oxide of the first layer is preferably SnO 2 or ZnO, and more preferably SnO 2 . In addition, the thickness of the first oxide layer 1 on the substrate is preferably 15-40 nm, more preferably 20-35 nm, most preferably 25-30 nm.
[0046] In one embodiment of the invention, the second oxide layer on the first oxide layer is most preferably SiO 2 . In addition, the preferred thickness of the second oxide layer 2 is 10-40 nm, more preferably 15-30 nm, most preferably 20-25 nm.
[0047] In one embodiment of the invention, ...
Embodiment 1
[0076] The present invention is prepared by conventional vacuum magnetron sputtering equipment, and the vacuum series after the process gas is introduced is guaranteed to be 10 -3 Under the condition of mbar-level working atmosphere, use fresh (production date no more than two months) raw construction-grade floats for plating.
[0077] The first layer of oxide layer 1 on the glass substrate 10: use Sn target material, in the argon-oxygen mixed gas atmosphere, under the condition that the flow rate of argon gas is 400 sccm, and the flow rate of oxygen gas is 1200 sccm, at a sputtering power of 50KW Next, sputter the oxide layer SnO with a thickness of 26-28nm 2 .
[0078] The second layer of oxide layer 2: using Si target material, in an argon-oxygen mixed gas atmosphere, under the conditions of argon flow rate of 500 sccm and oxygen flow rate of 1000 sccm, and a sputtering power of 57KW, the sputtering thickness is 20-22nm oxide layer SiO 2 .
[0079] The third oxide layer...
Embodiment 2
[0086] The process steps of this embodiment are the same as those of the above-mentioned embodiment 1, except that after the steps of the above-mentioned embodiment 1, the same four-layer oxide film is sputtered on the other side of the glass substrate according to the above-mentioned same steps. layer( figure 2 Middle 5, 6, 7, 8 floors).
[0087] Figure 5 and Figure 6 The spectral curves of double-sided low-reflection glass are respectively, and the obvious low-reflection effect can be seen in the wavelength range shown in the figure. The optical properties of the coated glass prepared using the above process parameters are as follows:
[0088] Visible light transmittance T=95%-98%;
[0089] Visible light coating surface reflectance R=0.3%-1.0%;
[0090] The reflection color value of the film surface is -4.0≤a*≤0, -4.0≤b*≤0.
[0091] The coated glass provided by the present invention adopts the above-mentioned multi-layer structure, especially the 4-layer anti-reflec...
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Abstract
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