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Plasma power supply device

A supply device and plasma technology, applied in the direction of plasma, output power conversion device, AC power input conversion to DC power output, etc., can solve problems such as difficulties, and achieve the effect of saving components and cost.

Inactive Publication Date: 2014-07-02
HUETTINGER ELEKTRONIK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] However, compared to class E operation, class D operation has the disadvantage that a very precise synchronization of the coacting switching elements is required, which becomes increasingly difficult at higher and higher switching frequencies and must be achieved Reference point for controlling the HSS relative to rapidly changing potentials

Method used

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  • Plasma power supply device
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Embodiment Construction

[0046] figure 1 A schematic diagram of an RF power generator 10 with an RF power amplifier arrangement 11 with a switching bridge 12 is shown. The switching bridge 12 comprises two switching elements S1 and S2 connected in series. The switching bridge 12 is connected both to the positive potential 13 of the DC power supply and to the negative potential 14 of the DC power supply. Let M denote the midpoint of the series circuit formed by switching elements S1 and S2. The midpoint M represents the output connection terminal of the switching bridge 12 . An output network 15 is connected to the midpoint M, said output network 15 having an output transformer 16 in this exemplary embodiment, to which a plasma load 17 is connected. The output network 15 has, in addition to the output transformer 16 , series capacitors, series inductors, resonant circuits, taps of the output transformer, and the like. An output network 15 without an output transformer 16 is also conceivable. Furth...

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Abstract

The invention relates to an HF power amplifier arrangement (11) having a DC supply arrangement and a switching bridge (12) connected to the DC supply arrangement, the switching bridge (12) comprising two switches at least indirectly connected in series elements (S1, S2) and the midpoint (M) of said switching bridge forms the output of the switching bridge, wherein the first switching element (S1) is controlled by means of an active control signal generator, provided for due to the An auxiliary circuit for generating a control signal for the second switching element (S2) by changing the working state of the first switching element (S1).

Description

technical field [0001] The invention relates to a plasma power supply device for generating a plasma with a frequency higher than 3 MHz and a power higher than 500 W, comprising an HF power amplifier device with a DC power supply device and a switched bridge connected thereto, said switched bridge comprising Two switching elements connected in series at least indirectly and the center point of the switching bridge form the switching bridge output, wherein the first switching element is controlled by an active control signal generator. Background technique [0002] Power amplifiers for exciting plasma processes (eg for RF sputtering, etching or for exciting gas lasers) in the frequency range from 1 to 50 MHz, especially at industrial frequencies 13.56, 27.12 and 40.68 MHz, are known. Such power amplifiers are available in different power classes from approximately 1 kW to several 100 kW. For smaller powers in the range of 1 to 20 kW, amplifiers based on semiconductor modules...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H02M7/5383H03F3/217H05H1/46
CPCH03F3/2171H02M7/53832H05H1/46H03K17/687
Inventor T·基希迈尔
Owner HUETTINGER ELEKTRONIK