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Cleaning system

A technology of cleaning system and drain valve, applied in the field of cleaning system, can solve the problems of low production efficiency, poor cleaning effect, waste of deionized water, etc.

Active Publication Date: 2013-02-13
深圳深爱半导体股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problems of poor cleaning effect, low production efficiency and more waste of deionized water in the traditional silicon wafer cleaning process, it is necessary to provide a cleaning system

Method used

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Embodiment Construction

[0033] In order to make the objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0034] The cleaning system of the present invention includes an overflow tank, figure 1 is a schematic diagram of an overflow sink in one embodiment. The overflow tank 110 includes a tank housing 12 and a spray head 14 for flushing. The water tank housing 112 includes a tank wall 122 and a tank bottom 124 connected to each other, and the tank bottom 124 defines a drain port 1242 .

[0035] In this embodiment, the overflow tank 110 further includes two inner tank structures 116 . The inner tank structure 116 is a square structure with no top and bottom, and is fixed inside the water tank housing 112 . Each inner tank structure 112 has a corresponding water outlet 1242 and a water inlet 1244 opened at the bottom 124 of the tank. In other e...

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Abstract

The invention relates to a cleaning system comprising a washover water tank, wherein the washover water tank comprises a water tank shell and a sprayer for flushing; the water tank shell comprises tank walls and a tank bottom which are mutually connected; a water inlet is arranged on the water tank shell; and the tank bottom is provided with a water outlet. In the invention, silicon wafers are simultaneously subjected to cleaning procedures of water spraying and overflowing in the washover water tank, and the water outlet is arranged at the tank bottom, thereby obtaining good cleaning effect, and saving the cleaning time and the consumption of deionized water.

Description

【Technical field】 [0001] The invention relates to a cleaning device in a semiconductor process, in particular to a cleaning system. 【Background technique】 [0002] In the traditional technology of silicon wafer cleaning in the workshop, the flower basket loaded with silicon wafers is generally put into the acid tank to boil for about ten minutes, and then the flower basket is taken out of the acid tank and then overflowed in the overflow tank for a period of time. Because the overflow tank is only provided with an overflow port on the upper part of the tank wall, the circulation of the water body is not smooth, resulting in poor results after overflow cleaning. After overflowing for 2 minutes, the pH value of the water in the overflow tank is about 4. In order to ensure the cleaning effect of the next batch of silicon wafers, the water valve of the overflow tank needs to be kept open, which causes a waste of deionized water. [0003] In order to improve the cleaning effect,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00B08B3/02B08B3/04F16K31/12
Inventor 王友旺裴新林盛浩胡华肖雁行刘宝亮
Owner 深圳深爱半导体股份有限公司