Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

liquid crystal medium

A liquid crystal medium, medium technology, applied in liquid crystal materials, chemical instruments and methods, etc., can solve the problems of image retention, image burning, etc.

Active Publication Date: 2011-11-30
MERCK PATENT GMBH
View PDF15 Cites 40 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0030] In LCD TV applications, if the display has been addressed (angesteuert) for longer periods of time, so-called reliability problems often arise, such as image retention, i.e. "burned" images seen

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • liquid crystal medium
  • liquid crystal medium
  • liquid crystal medium

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0042] a) R in formula I 1 and R 1＊ Indicates straight-chain alkyl, especially C 2 h 5 , n-C 3 h 7 , n-C 4 h 9 , and n-C 5 h 11 , n-C 6 h 13 . Particularly preferably, R 1 means n-C 3 h 7 and R 1＊ means CH 3 、C 2 h 5 or n-C 3 h 7 .

[0043] b) Liquid-crystalline media comprising one, two, three, four or more, preferably one, two or three compounds of the formula I.

[0044] c) liquid-crystalline media in which the proportion of compounds of the formula I in the overall mixture is ≧3% by weight, preferably ≧10% by weight, particularly preferably ≧15% by weight. Particular preference is given to liquid-crystalline media comprising 3 to 50%, preferably 25 to 35%, of one or more compounds of the formula I. Compounds of formula I in which a=0 are preferably contained in the mixture in an amount of 15-35%. Compounds of formula I in which a=1 are preferably contained in the mixture in an amount of 3-30%.

[0045] d) Preferred compounds of formula I are compoun...

Embodiment 1

[0301]

Embodiment 2

[0303]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a liquid crystal medium having negative dielectric anisotropy, comprising at least one compound of the formula (I), where R1, R1*, and a have the meanings indicated in Claim 1, and to the use thereof for an active matrix display, particularly based on the VA, PS-VA, PALC, FFS, or IPS effect.

Description

field of invention [0001] The invention relates to liquid-crystalline media comprising at least one compound of the formula I and having negative dielectric anisotropy [0002] [0003] in [0004] R 1 and R 1＊ each independently of each other represents an alkyl group having 1-6 C atoms, and [0005] a means 0 or 1. Background technique [0006] Such media can be used in particular for electro-optical displays with active-matrix addressing based on the ECB effect and for IPS (In-Plane Switching) displays or FFS (Fringe Field Switching) displays. [0007] The principle of electrically controlled birefringence, the ECB effect (electrically controlled birefringence) or also the DAP (Alignment Distortion) effect was first described in 1971 (M.F.Schieckel and K.Fahrenschon, "Deformation of nematic liquid crystals with vertical orientation in electrical fields" , Appl. Phys. Lett. 19 (1971), 3912). Then there are the works of J. F. Kahn (Appl. Phys. Lett. 20 (1972), 1193...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C09K19/30C09K19/44
CPCC09K2019/3408C09K2019/0411C09K19/44C09K2019/0407C09K2019/3004C09K2019/0448C09K2019/301C09K19/32C09K19/3001C09K2019/3425C09K19/3003C09K2019/3016C09K2019/3027C09K2323/00C09K19/12
Inventor M·克拉森-梅默M·布雷默K·施奈德D·保卢特
Owner MERCK PATENT GMBH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com